Wetting/Non-wetting behaviour of quadrupolar molecules (N2, C2H4, CO2) on Planar Substrates

2021 ◽  
pp. 129502
Author(s):  
Hui Xu ◽  
Krittamet Phothong ◽  
D.D. Do ◽  
D. Nicholson
Keyword(s):  
Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 281-293
Author(s):  
Dariusz Korzec ◽  
Florian Hoppenthaler ◽  
Anatoly Shestakov ◽  
Dominik Burger ◽  
Andrej Shapiro ◽  
...  

The piezoelectric cold plasma generators (PCPG) allow for production of the piezoelectric direct discharge (PDD), which is a kind of cold atmospheric pressure plasma (APP). The subjects of this study are different arrays of PCPGs for large-area treatment of planar substrates. Two limiting factors are crucial for design of such arrays: (i) the parasitic coupling between PCPGs resulting in minimum allowed distance between devices, and (ii) the homogeneity of large area treatment, requiring an overlap of the activation zones resulting from each PCPG. The first limitation is investigated by the use of electric measurements. The minimum distance for operation of 4 cm between two PCPGs is determined by measurement of the energy coupling from an active PCPG to a passive one. The capacitive probe is used to evaluate the interference between signals generated by two neighboring PCPGs. The second limitation is examined by activation image recording (AIR). Two application examples illustrate the compromising these two limiting factors: the treatment of large area planar substrates by PCPG array, and the pretreatment of silicon wafers with an array of PCPG driven dielectric barrier discharges (DBD).


2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Robert Zimmermann ◽  
Michael Seidling ◽  
Peter Hommelhoff

AbstractElectron and ion beams are indispensable tools in numerous fields of science and technology, ranging from radiation therapy to microscopy and lithography. Advanced beam control facilitates new functionalities. Here, we report the guiding and splitting of charged particle beams using ponderomotive forces created by the motion of charged particles through electrostatic optics printed on planar substrates. Shape and strength of the potential can be locally tailored by the lithographically produced electrodes’ layout and the applied voltages, enabling the control of charged particle beams within precisely engineered effective potentials. We demonstrate guiding of electrons and ions for a large range of energies (from 20 to 5000 eV) and masses (from 5 · 10−4 to 131 atomic mass units) as well as electron beam splitting for energies up to the keV regime as a proof-of-concept for more complex beam manipulation.


Author(s):  
Y.C. Tsui ◽  
T.W. Clyne

Abstract An analytical model has been developed to predict the residual stress distributions in thermal spray coatings on substrates of finite thickness. This is based on the concept of a misfit strain, caused by either the quenching of splats or by differential thermal contraction during cooling. During spraying, the coatings are asssumed to deposit on the substrate in a progressive (layer-by-layer) manner. Although the misfit strain ("the quenching strain") is the same for each successive incremental layer of deposit, this is imposed each time on a "substrate" of changing thickness. The final stress distribution will in general differ from that which would result if the coating were imposed on the substrate (with the same misfit strain) in a single operation. The model is straightforward to apply: for example, it can be implemented using a standard spreadsheet program. The required input data are the quenching strain (or stress), the spraying temperature, material properties and specimen dimensions. Comparisons have been made between the predictions from this model and from a numerical model for two plasma sprayed systems. Good agreement is observed. The effects of varying certain parameters, such as coating thickness, substrate thickness, coating stiffness, etc, are readily explored, so that the model provides a useful tool for controlling residual stress levels. Application of the model to determine the quenching stress, in conjunction with the use of a curvature monitoring technique, is briefly outlined. In addition, an analysis is made of the errors introduced by using Stoney's equation to deduce stress levels from curvature measurements.


Author(s):  
G. Puu ◽  
I. Gustafson ◽  
P.-Å. Ohlsson ◽  
G. Olofsson ◽  
Å. Sellström

1988 ◽  
Vol 93 (1-4) ◽  
pp. 850-856 ◽  
Author(s):  
R. Bhat ◽  
E. Kapon ◽  
D.M. Hwang ◽  
M.A. Koza ◽  
C.P. Yun

1995 ◽  
Vol 26 (8) ◽  
pp. 881-886 ◽  
Author(s):  
E. Kapon ◽  
G. Biasiol ◽  
D.M. Hwang ◽  
E. Colas

2020 ◽  
Vol 91 (1) ◽  
pp. 013905 ◽  
Author(s):  
Martin Becker ◽  
Xingda Li ◽  
Torsten Henning ◽  
Peter J. Klar
Keyword(s):  
Ion Beam ◽  

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