An assessment of intrinsic noise of pseudo-reference electrodes and instrumental noise to enable reliable electrochemical noise measurements in situ on organically coated metal

2021 ◽  
pp. 139279
Author(s):  
Sina S Jamali ◽  
Douglas Mills
Keyword(s):  
Electrochemical Noise ◽  
Intrinsic Noise ◽  
Reference Electrodes ◽  
Instrumental Noise ◽  
Coated Metal ◽  
Noise Measurements

Electrochemical Characterization of the Structural Metals Immersed in Natural Seawater: In Situ Measures

2013 ◽  
Vol 755 ◽  
pp. 119-124 ◽  
Author(s):  
Ricardo Galván-Martínez ◽  
David Cabrera de la Cruz ◽  
Gonzalo Galicia-Aguilar ◽  
Ricardo Orozco-Cruz ◽  
Antonio Contreras-Cuevas
Keyword(s):  
Electrochemical Noise ◽  
Reference Electrode ◽  
Electrochemical Corrosion ◽  
Electrochemical Technique ◽  
Natural Seawater ◽  
Localization Index ◽  
Noise Measurements ◽  
Structural Metals

This work presents the electrochemical corrosion results of the structural metals, aluminium (Al), brass and copper (Cu), immersed in coastal waters of Veracruz Port in Mexico at room temperature, atmospheric pressure and eight weeks of the exposition time. The electrochemical technique used was electrochemical noise (EN). A typical three-electrode electrochemical cell was used. Where the reference electrode was the silver/seawater (Ag/SW) and two nominally identical metallic samples were used as working electrodes (WE1 and WE2). The metallic samples of Al, brass and Cu were used as working electrode. The potential and current fluctuations were measured simultaneously between the two working electrodes (current measured) and the Ag/SW electrode (potential measured). The electrochemical noise measurements (ENM) were analysed by three different methods: Potential and current versus time (transients), Localization Index (LI) and Electrochemical Noise Resistance (Rn). The results shown a good correlation between the superficial analysis and the results obtained by the ENM. In addition, Cu presents the highest corrosion rate and, a corrosion attack was obtained by localization index; this behaviour was confirmed by superficial analysis.

Use of Multiple Reference Electrodes in Electrochemical Noise Measurements

CORROSION ◽  
2003 ◽  
Vol 59 (7) ◽  
pp. 629-634 ◽  
Author(s):  
U. Bertocci ◽  
F. Huet ◽  
R. P. Nogueira
Keyword(s):  
Electrochemical Noise ◽  
Reference Electrodes ◽  
Noise Measurements ◽  
Multiple Reference

Modeling data acquisition during electrochemical noise measurements for corrosion studies

2015 ◽  
Vol 33 (3-4) ◽  
pp. 187-194
Author(s):  
Michele Curioni ◽  
Tullio Monetta ◽  
Francesco Bellucci
Keyword(s):  
Electrochemical Noise ◽  
Noise Signal ◽  
Corrosion Monitoring ◽  
Digital Conversion ◽  
Analog To Digital ◽  
Instrumental Noise ◽  
Analog To Digital Conversion ◽  
Noise Measurements ◽  
Modeling Data ◽  
Electrical Interference

AbstractElectrochemical noise measurement and analysis enable one to obtain information on corroding systems without applying any potential or current perturbation to the corroding surface, and they are thereby nondestructive techniques, suitable for corrosion monitoring. The measurement process requires converting the analog potential or current signal in a digital dataset that can be used to perform mathematical operations with a variety of approaches. The analog-to-digital conversion is a critical step since, after the conversion has been performed, it is impossible to correct for artefacts that occurred during the conversion. Additionally, the electrochemical noise generated during corrosion is generally overlapped to the instrumental noise and to the electrical interference that are present in the environment where the measurement is performed. In this work, the process of analog-to-digital conversion of electrochemical noise signals is analyzed in detail by simulating the conversion of a representative simulated noise signal. With this approach, the possible issues arising from the analog-to-digital conversion process are highlighted and the key features arising from instrumental noise, aliasing, and electrical interference are identified.

scholarly journals In-Situ Evaluation of the Protectivity of Coatings Applied to Metal Cultural Artefacts Using Non-Destructive Electrochemical Measurements

2021 ◽  
Vol 2 (1) ◽  
pp. 120-132
Author(s):  
Douglas J. Mills ◽  
Katarzyna Schaefer ◽  
Tomasz Wityk
Keyword(s):  
Baltic Sea ◽  
Electrochemical Noise ◽  
Organic Coating ◽  
Noise Measurement ◽  
The Baltic Sea ◽  
Coating Type ◽  
The Baltic ◽  
Non Destructive ◽  
Electrolytic Resistance

Electrochemical Noise Measurement (ENM) and DC electrolytic resistance measurement (ERM) can be used to assess the level of protectiveness provided by an organic coating (paint or varnish) to the underlying metal. These techniques also have applicability to the thinner, transparent type of coatings used to protect archaeological artefacts. Two studies are presented here demonstrating how ERM and ENM techniques can be applied in artefact preservation. The similarity of the techniques, both of which are a measure of resistance, means results can be considered to be analogous. The first study investigated the use of ERM to determine the protection levels provided by typical coatings in order to develop a database of coating type and application for objects, for specific environments. The second study used ENM to evaluate coatings which had been applied to historic artefacts recovered from shipwrecks in the Baltic Sea and displayed inside the museum or kept in the museum store area. The studies showed the usefulness of both techniques for determining the level of protection of a coating and how a better performing coating can be specified if a pre-existing coating on an artefact has been found to be unsuitable.

Single-Crystalline and Bamboo Al Lines Fabricated by Graphoepitaxy: Microstructure and 1/f Noise Measurements

1996 ◽  
Vol 428 ◽  
Author(s):  
Marc J.C. Van Den Homberg ◽  
A. H. Verbruggen ◽  
P. F. A. Alkemade ◽  
S. Radelaar
Keyword(s):  
Integrated Circuits ◽  
Grain Boundaries ◽  
Low Noise ◽  
Dc Magnetron Sputtering ◽  
Rapid Thermal Anneal ◽  
Single Crystalline ◽  
Noise Measurements ◽  
Scaling Down ◽  
Sputter Deposited

AbstractThe continuing scaling-down of integrated circuits leads to increased metallization reliability problems, especially electromigration. We used 1/f noise measurements to study the relation between electromigration and microstructure. These measurements are very sensitive to the microstructural attributes, such as grain boundaries and dislocations. Al lines were grown by graphoepitaxy: First, a pure Al film was grown by dc magnetron sputtering on a groove pattern etched into a SiO2 substrate. The growth was then followed by an in situ rapid thermal anneal that resulted in a complete filling of the grooves with Al. These Al lines were carefully characterized with SEM and Backscatter Kikuchi Diffraction. Depending on the presence of a temperature gradient during the anneal, the lines were either nearly single-crystalline or bamboo with one grain per ∼ 3 μm. The resistivity was ∼ 2.8 μΩcm, only slightly higher than for bulk Al. We measured the 1/f noise with the two-channel ac technique at RT. We found in both bamboo as well as the single-crystalline lines a very low noise intensity; a factor two lower than in conventionally sputter deposited and annealed Al lines. No clear difference between the noise spectra of the bamboo and the single-crystalline lines was observed. We concluded that grain boundaries are not the only contributor to 1/f noise; other types of defects must play a role as well.

Sign in / Sign up

Export Citation Format

Share Document