Influence of process parameters on CET in Ti–Al alloy ingot with consideration of shrinkage cavity formation: A computer simulation

2007 ◽  
Vol 441 (1-2) ◽  
pp. 267-277 ◽  
Author(s):  
Shi Ping Wu ◽  
Dong Rong Liu ◽  
Jing Jie Guo ◽  
Yan Qing Su ◽  
Heng Zhi Fu
2011 ◽  
Vol 43 (2) ◽  
pp. 505-519 ◽  
Author(s):  
Troy D. Topping ◽  
Byungmin Ahn ◽  
Ying Li ◽  
Steven R. Nutt ◽  
Enrique J. Lavernia

1990 ◽  
Vol 198 ◽  
Author(s):  
S. Kang ◽  
T.J. Jasinski ◽  
G.S. Tompa ◽  
R.A. Stall

ABSTRACTThe optimization of chemical vapor deposition processes requires an understanding of the influence of various process parameters on the deposition of thin films. A recently developed computer simulation tool provides a powerful means to develop this understanding. This paper describes the use of the computer program, FLUENT, to study the gas flow, temperature, and chemical species distributions during the deposition of CdTe. Numerical results are reported for two operating conditions for an EMCORE vertical high-speed rotating disk growth reactor and are compared to experimental data. The influence of process parameters is discussed. The effects of the addition of significant amounts of Hg (several percent) to the process gas is evaluated.


2019 ◽  
Vol 34 (3) ◽  
pp. 367-375
Author(s):  
L.-X. Wang ◽  
D.-F. Wang ◽  
L. Jiang ◽  
N. Bian ◽  
Q. Li ◽  
...  

2021 ◽  
Vol 54 ◽  
pp. 961-971
Author(s):  
Sergey Shantarenko ◽  
Victor Kuznetsov ◽  
Eugene Ponomarev ◽  
Alexander Vaganov ◽  
Alexey Evseev

Sign in / Sign up

Export Citation Format

Share Document