Self-organized formation of nano-multilayer structure in the carbon-copper thin film during reactive magnetron sputtering deposition process

2017 ◽  
Vol 722 ◽  
pp. 242-249 ◽  
Author(s):  
Weiqi Wang ◽  
Li Ji ◽  
Hongxuan Li ◽  
Huidi Zhou ◽  
Jianmin Chen
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Multilayer Structure ◽  
Deposition Process ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Copper Thin Film ◽  
Sputtering Deposition ◽  
Self Organized

Growth of Anatase TiO2 Thin Film for Photokilling of Bacteria by DC Reactive Magnetron Sputtering Technique

2013 ◽  
Vol 770 ◽  
pp. 173-176 ◽  
Author(s):  
Suree Tongwanichniyom ◽  
Wichian Siriprom ◽  
Dhonluck Manop ◽  
Adisorn Buranawong ◽  
Jakrapong Kaewkhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Magnetron Sputtering ◽  
Gas Flow ◽  
Uv Light ◽  
Grazing Incidence ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Force Microscopy ◽  
Dc Reactive Magnetron Sputtering

Titanium dioxide (TiO2) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique at different O2 gas flow rates. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD), surface morphology was analyzed by atomic force microscopy (AFM) and disinfection of surfaces by photo catalytic oxidation with TiO2 and UV light irradiation. The results showed that, from GIXRD results, all as-deposited TiO2 films have crystal structure of TiO2 corresponding to the A(101) and A(200). AFM results showed that the film thicknesses increase from 183 nm to 238 nm with increasing of O2 gas flow rate, while the film roughness was in range of 4.8 nm to 5.9 nm. The as-deposited anatase TiO2 thin film in this work can kill the bacteria when expose to the UV light.

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