Effect of methane gas on the properties of nitrogenated amorphous carbon films grown by surface wave microwave plasma CVD

2005 ◽  
Vol 351 (30-32) ◽  
pp. 2562-2567 ◽  
Author(s):  
M. Rusop ◽  
A.M.M. Omer ◽  
S. Adhikary ◽  
T. Soga ◽  
T. Jimbo ◽  
...  
Keyword(s):  
Surface Wave ◽  
Amorphous Carbon ◽  
Microwave Plasma ◽  
Carbon Films ◽  
Plasma Cvd ◽  
Amorphous Carbon Films ◽  
Methane Gas ◽  
Microwave Plasma Cvd

Fluorine incorporated amorphous carbon thin films prepared by Surface Wave Microwave Plasma CVD

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1697-1701 ◽  
Author(s):  
Golap Kalita ◽  
Hare Ram Aryal ◽  
Sudip Adhikari ◽  
Dilip C. Ghimire ◽  
Rakesh A. Afre ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Carbon Thin Films

Effects of ethylene gas flow rate on optoelectrical properties of nitrogenated thin amorphous carbon films grown by microwave surface wave plasma CVD

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1724-1727 ◽  
Author(s):  
Dilip C. Ghimire ◽  
S. Adhikari ◽  
H.R. Aryal ◽  
S.M. Mominuzzamn ◽  
T. Soga ◽  
...  
Keyword(s):  
Surface Wave ◽  
Amorphous Carbon ◽  
Flow Rate ◽  
Gas Flow ◽  
Carbon Films ◽  
Gas Flow Rate ◽  
Plasma Cvd ◽  
Amorphous Carbon Films

The role of pressure on thin amorphous carbon films deposited using microwave surface wave plasma CVD

2006 ◽  
Vol 15 (11-12) ◽  
pp. 1792-1794 ◽  
Author(s):  
Dilip Chandra Ghimire ◽  
Sudip Adhikari ◽  
Hideo Uchida ◽  
Masayoshi Umeno
Keyword(s):  
Surface Wave ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Plasma Cvd ◽  
Amorphous Carbon Films

THE OPTICAL PROPERTIES OF NITROGENATED AMORPHOUS CARBON FILMS GROWN BY A NOVEL SURFACE WAVE MICROWAVE PLASMA CVD METHOD

2004 ◽  
Vol 18 (18) ◽  
pp. 987-1001 ◽  
Author(s):  
M. RUSOP ◽  
S. ADHIKARI ◽  
A. M. M. OMER ◽  
S. ADHIKARY ◽  
H. UCHIDA ◽  
...  
Keyword(s):  
Optical Properties ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Annealing Temperature ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Cvd Method ◽  
Wide Range ◽  
Bonding Properties

The effects of annealing temperature on the optical properties of nitrogenated amorphous carbon (a-C:N) films grown on quartz substrates by a novel surface wave microwave plasma chemical vapor deposition (SWMP-CVD) method are reported. The thickness, optical, structural and bonding properties of the as-grown and anneal-treated a-C:N films were measured and compared. The film thickness decreased rapidly with increasing annealing temperature above 350°C. A wide range of optical absorption characteristics is observed, depending on the annealing temperature. The optical band gap of as-grown a-C:N films is approximately 2.8 eV, gradually decreasing to 2.5 eV for the films anneal-treated at 300°C, and beyond that decreasing rapidly down to 0.9 eV at 500°C. The Raman and FTIR spectroscopy measurements have shown that the structural and composition of the films can be tuned by optimizing the annealing temperature. The change of optical, structural and bonding properties of SWMP-CVD-grown a-C:N films with higher annealing temperature was attributed to the fundamental changes in the bonding and band structures of the films.

scholarly journals Properties of Amorphous Carbon Films Synthesized by Atmospheric Pressure Glow Plasma CVD Method

2006 ◽  
Vol 19 (5) ◽  
pp. 673-678 ◽  
Author(s):  
Hideyuki Kodama ◽  
Satoshi Iizumi ◽  
Masayuki Nakaya ◽  
Akira Shirakura ◽  
Atsushi Morita ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Atmospheric Pressure ◽  
Carbon Films ◽  
Plasma Cvd ◽  
Amorphous Carbon Films ◽  
Cvd Method ◽  
Atmospheric Pressure Glow Plasma ◽  
Glow Plasma

Structural and mechanical characterization of diamond like carbon films grown by microwave plasma CVD

2010 ◽  
Vol 204 (16-17) ◽  
pp. 2817-2821 ◽  
Author(s):  
Sambita Sahoo ◽  
Swati S. Pradhan ◽  
Venkateswarlu Bhavanasi ◽  
S.K. Pradhan
Keyword(s):  
Mechanical Characterization ◽  
Microwave Plasma ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd
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