High-performance solid-state on-chip supercapacitors based on Si nanowires coated with ruthenium oxide via atomic layer deposition

2017 ◽  
Vol 341 ◽  
pp. 1-10 ◽  
Author(s):  
Wen Zheng ◽  
Qingmei Cheng ◽  
Dunwei Wang ◽  
Carl V. Thompson
Keyword(s):  
Solid State ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Ruthenium Oxide ◽  
Atomic Layer ◽  
Si Nanowires ◽  
Layer Deposition ◽  
On Chip

Nanoengineering of the Cu2ZnSnS4–TiO2 interface via atomic layer deposition of Al2O3 for high sensitivity photodetectors and solid state solar cells

2018 ◽  
Vol 6 (24) ◽  
pp. 11507-11520 ◽  
Author(s):  
Zhuoran Wang ◽  
Nicolas Brodusch ◽  
Raynald Gauvin ◽  
George P. Demopoulos
Keyword(s):  
Solar Cells ◽  
Solid State ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
High Sensitivity ◽  
Atomic Layer ◽  
Band Alignment ◽  
Sn Doping ◽  
Layer Deposition

Al2O3 nanoislands on the Cu2ZnSnS4–TiO2 interface prevented Sn doping and optimized the band alignment for high performance photodetectors and solar cells.

Atomic Layer Deposition of Functional Layers for on Chip 3D Li-Ion All Solid State Microbattery

2016 ◽  
Vol 7 (2) ◽  
pp. 1601402 ◽  
Author(s):  
Manon Létiche ◽  
Etienne Eustache ◽  
Jeremy Freixas ◽  
Arnaud Demortière ◽  
Vincent De Andrade ◽  
...  
Keyword(s):  
Solid State ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Li Ion ◽  
On Chip

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

Ozone-Based Atomic Layer Deposition of Crystalline V2O5 Films for High Performance Electrochemical Energy Storage

2012 ◽  
Vol 24 (7) ◽  
pp. 1255-1261 ◽  
Author(s):  
Xinyi Chen ◽  
Ekaterina Pomerantseva ◽  
Parag Banerjee ◽  
Keith Gregorczyk ◽  
Reza Ghodssi ◽  
...  
Keyword(s):  
Energy Storage ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electrochemical Energy Storage ◽  
Layer Deposition ◽  
Electrochemical Energy

scholarly journals Nanoscale Solid State Batteries Enabled by Thermal Atomic Layer Deposition of a Lithium Polyphosphazene Solid State Electrolyte

2017 ◽  
Vol 29 (8) ◽  
pp. 3740-3753 ◽  
Author(s):  
Alexander J. Pearse ◽  
Thomas E. Schmitt ◽  
Elliot J. Fuller ◽  
Farid El-Gabaly ◽  
Chuan-Fu Lin ◽  
...  
Keyword(s):  
Solid State ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Solid State Electrolyte ◽  
Layer Deposition ◽  
Solid State Batteries

Impact of the atomic layer deposition precursors diffusion on solid-state carbon nanotube based supercapacitors performances

2015 ◽  
Vol 26 (6) ◽  
pp. 064002 ◽  
Author(s):  
Giuseppe Fiorentino ◽  
Sten Vollebregt ◽  
F D Tichelaar ◽  
Ryoichi Ishihara ◽  
Pasqualina M Sarro
Keyword(s):  
Carbon Nanotube ◽  
Solid State ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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