Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3534023 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AC09 ◽

Author(s):

B. Hudec ◽

K. Hušeková ◽

E. Dobročka ◽

J. Aarik ◽

R. Rammula ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Dielectric Layer ◽

Atomic Layer ◽

Metal Insulator ◽

Rutile Tio2 ◽

Layer Deposition ◽

Metal Insulator Metal

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Precision defect engineering of metal/insulator/metal diodes using atomic layer deposition to localize Ni impurities in Al2O3 tunnel barriers

Journal of Applied Physics ◽

10.1063/5.0045721 ◽

2021 ◽

Vol 129 (14) ◽

pp. 144502

Author(s):

Konner E. K. Holden ◽

Yitong Qi ◽

John F. Conley

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Defect Engineering ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal ◽

Tunnel Barriers

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Influence of precursor chemistry and growth temperature on the electrical properties of SrTiO3-based metal-insulator-metal capacitors grown by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3525280 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AC04 ◽

Author(s):

H. García ◽

H. Castán ◽

A. Gómez ◽

S. Dueñas ◽

L. Bailón ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Growth Temperature ◽

Atomic Layer ◽

Precursor Chemistry ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Comparative study and characterization of atomic layer deposition Al2O3 films as metal-insulator-metal capacitor dielectric for GaAs hetero-junction bipolar transistor technology

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5112773 ◽

2019 ◽

Vol 37 (5) ◽

pp. 050903

Author(s):

Jiro Yota ◽

Mehran Janani ◽

Hal M. Banbrook ◽

Patrick Rabinzohn ◽

Markus Bosund

Keyword(s):

Atomic Layer Deposition ◽

Comparative Study ◽

Atomic Layer ◽

Bipolar Transistor ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal ◽

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High-voltage metal-insulator-metal capacitor based on crystalline HfAlOxfilm grown by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5054848 ◽

2019 ◽

Vol 37 (1) ◽

pp. 011209 ◽

Author(s):

Michael Lisiansky ◽

Inna Popov ◽

Vladimir Uvarov ◽

Valentina Korchnoy ◽

Boris Meyler ◽

...

Keyword(s):

Atomic Layer Deposition ◽

High Voltage ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Composition influence on the physical and electrical properties of SrxTi1−xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

Journal of Applied Physics ◽

10.1063/1.3246835 ◽

2009 ◽

Vol 106 (9) ◽

pp. 094101 ◽

Author(s):

N. Menou ◽

M. Popovici ◽

S. Clima ◽

K. Opsomer ◽

W. Polspoel ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Electrical characteristics and step coverage of ZrO2films deposited by atomic layer deposition for through-silicon via and metal–insulator–metal applications

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.016502 ◽

2015 ◽

Vol 55 (1) ◽

pp. 016502 ◽

Author(s):

Kyeong-Keun Choi ◽

Chan-Gyung Park ◽

Deok-kee Kim

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Electrical Characteristics ◽

Metal Insulator ◽

Through Silicon Via ◽

Step Coverage ◽

Layer Deposition ◽

Metal Insulator Metal

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Electrical Characteristics of HfO2-Al2O3 Dielectric Thin Films Grown by Atomic-Layer-Deposition in Metal-Insulator-Metal Capacitor Configuration

ECS Meeting Abstracts ◽

10.1149/ma2007-01/17/816 ◽

2007 ◽

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Electrical Characteristics ◽

Metal Insulator ◽

Dielectric Thin Films ◽

Layer Deposition ◽

Metal Insulator Metal

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Effects of Annealing Temperature on the Characteristics of HfSixOy-HfO2 Films Deposited for Metal-Insulator-Metal Capacitors by Using Atomic Layer Deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.50.1865 ◽

2007 ◽

Vol 50 (6) ◽

pp. 1865 ◽

Author(s):

S.-W. Jeong ◽

Y. Roh

Keyword(s):

Atomic Layer Deposition ◽

Annealing Temperature ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Low Leakage Current Al2O3 Metal-Insulator-Metal Capacitors Formed By Atomic Layer Deposition at Optimized Process Temperature and O2 Post Deposition Annealing

ECS Meeting Abstracts ◽

10.1149/ma2016-01/23/1174 ◽

2016 ◽

Keyword(s):

Atomic Layer Deposition ◽

Leakage Current ◽

Atomic Layer ◽

Post Deposition Annealing ◽

Metal Insulator ◽

Low Leakage ◽

Low Leakage Current ◽

Layer Deposition ◽

Metal Insulator Metal ◽

Post Deposition

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