Lateral profiling of gate dielectric damage by off-state stress and positive-bias temperature instability
Keyword(s):
Keyword(s):
2008 ◽
Vol 55
(7)
◽
pp. 1630-1638
◽
Keyword(s):
Keyword(s):
Impact of Hf content on positive bias temperature instability reliability of HfSiON gate dielectrics
2010 ◽
Vol 50
(5)
◽
pp. 614-617
◽
Keyword(s):