Positive-Bias Temperature Instability Improvement of Poly-Si Thin-Film Transistor With HfO2 Gate Dielectric by Ammonia Plasma Treatment

2016 ◽  
Vol 44 (12) ◽  
pp. 3153-3157
Author(s):  
William Cheng-Yu Ma ◽  
Zheng-Yi Lin ◽  
Yao-Sheng Huang ◽  
Bo-Siang Huang ◽  
Zheng-Da Wu
Keyword(s):  
Thin Film ◽  
Plasma Treatment ◽  
Gate Dielectric ◽  
Thin Film Transistor ◽  
Positive Bias ◽  
Temperature Instability ◽  
Ammonia Plasma ◽  
Bias Temperature Instability ◽  
Si Thin Film

Positive bias temperature instability of irradiated n-channel thin film transistors

2014 ◽  
Vol 556 ◽  
pp. 535-538 ◽  
Author(s):  
Emil V. Jelenković ◽  
Milan S. Kovačević ◽  
Dragan Z. Stupar ◽  
Shrawan Jha ◽  
Jovan S. Bajić ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Positive Bias ◽  
Temperature Instability ◽  
Bias Temperature Instability

Lateral profiling of gate dielectric damage by off-state stress and positive-bias temperature instability

2021 ◽  
Vol 127 ◽  
pp. 114383
Author(s):  
Geon-Beom Lee ◽  
Choong-Ki Kim ◽  
Tewook Bang ◽  
Min-Soo Yoo ◽  
Yang-Kyu Choi
Keyword(s):  
Gate Dielectric ◽  
Positive Bias ◽  
Temperature Instability ◽  
Bias Temperature Instability ◽  
State Stress
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