Dual metal gate tunneling field effect transistors based on MOSFETs: A 2-D analytical approach

2018 ◽  
Vol 113 ◽  
pp. 41-56 ◽  
Author(s):  
Zeinab Ramezani ◽  
Ali A. Orouji
Electronics ◽  
2019 ◽  
Vol 8 (3) ◽  
pp. 282 ◽  
Author(s):  
Liang Dai ◽  
Weifeng Lü ◽  
Mi Lin

We investigate the effect of random dopant fluctuation (RDF)-induced variability in n-type junctionless (JL) dual-metal gate (DMG) fin field-effect transistors (FinFETs) using a 3D computer-aided design simulation. We show that the drain voltage (VDS) has a significant impact on the electrostatic integrity variability caused by RDF and is dependent on the ratio of gate lengths. The RDF-induced variability also increases as the length of control gate near the source decreases. Our simulations suggest that the proportion of the gate metal near the source to the entire gate should be greater than 0.5.


Micromachines ◽  
2021 ◽  
Vol 12 (6) ◽  
pp. 609
Author(s):  
Chen Chong ◽  
Hongxia Liu ◽  
Shulong Wang ◽  
Shupeng Chen ◽  
Haiwu Xie

Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped gates to enhance the on-state current and to generate the tunneling probability. In this paper, TGTFET subjected to heavy-ion irradiation is studied by technology computer-aided design (TCAD) simulation for the first time. The results show that as the drain bias and linear energy transfer (LET) increase, the transient current and collected charge also increase. When LET = 100 MeV·cm2/mg and Vd = 0.5 V, the transient current of TGTFET is as high as 10.63 mA, which is much larger than the on-state current. This means that TGTFET is more sensitive to single-event effect (SEE) than FDSOI. By simulating a heavy-ion strike on different locations in TGTFET, the tunneling junction is the most sensitive region of SEE. This provides guidance for future research on the antiradiation application of TFET-based devices.


Author(s):  
D. Leonelli ◽  
A. Vandooren ◽  
R. Rooyackers ◽  
A. S. Verhulst ◽  
S. De Gendt ◽  
...  

2010 ◽  
Vol 49 (4) ◽  
pp. 04DC10 ◽  
Author(s):  
Daniele Leonelli ◽  
Anne Vandooren ◽  
Rita Rooyackers ◽  
Anne S. Verhulst ◽  
Stefan De Gendt ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document