scholarly journals Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors

Micromachines ◽  
2021 ◽  
Vol 12 (6) ◽  
pp. 609
Author(s):  
Chen Chong ◽  
Hongxia Liu ◽  
Shulong Wang ◽  
Shupeng Chen ◽  
Haiwu Xie

Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped gates to enhance the on-state current and to generate the tunneling probability. In this paper, TGTFET subjected to heavy-ion irradiation is studied by technology computer-aided design (TCAD) simulation for the first time. The results show that as the drain bias and linear energy transfer (LET) increase, the transient current and collected charge also increase. When LET = 100 MeV·cm2/mg and Vd = 0.5 V, the transient current of TGTFET is as high as 10.63 mA, which is much larger than the on-state current. This means that TGTFET is more sensitive to single-event effect (SEE) than FDSOI. By simulating a heavy-ion strike on different locations in TGTFET, the tunneling junction is the most sensitive region of SEE. This provides guidance for future research on the antiradiation application of TFET-based devices.

2020 ◽  
Vol 1004 ◽  
pp. 889-896
Author(s):  
Joseph McPherson ◽  
Collin W. Hitchcock ◽  
T. Paul Chow ◽  
Wei Ji ◽  
Andrew Woodworth

This paper describes the mechanisms behind the failure of silicon carbide (SiC) Power MOSFETs (metal oxide semiconductor field effect transistors) when struck by a heavy ion. The modeled device is designed to simulate a commercially available 1200 V power MOSFET under the strike of a silver ion with a Linear Energy Transfer (LET) of 46 MeV-cm2/mg commonly used in single event effect (SEE) testing. The device is shown in simulation to fail near 500 V, which is in close agreement to experiments. The failure occurs near the interface between the epitaxial layer and the substrate layer due to the rapid increase of the electric field in that region and destruction of the device from impact ionization. Two improved designs were proposed and investigated that would help to mitigate the electric field in these regions and improve the device’s tolerance to single-event burnout (SEB). The new designs increased the voltage at which SEB occurs from 500 V to over 900 V and increased the specific on-resistance (Ron,sp) by only 5%.


Author(s):  
D. Leonelli ◽  
A. Vandooren ◽  
R. Rooyackers ◽  
A. S. Verhulst ◽  
S. De Gendt ◽  
...  

2010 ◽  
Vol 49 (4) ◽  
pp. 04DC10 ◽  
Author(s):  
Daniele Leonelli ◽  
Anne Vandooren ◽  
Rita Rooyackers ◽  
Anne S. Verhulst ◽  
Stefan De Gendt ◽  
...  

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