Effect of intermediate layer on wear-delamination life of low-frictional SiC-2.6mass%Ti film sputter-deposited on titanium substrate

An attempt is made to find out the optimal compositions for the intermediate oxide layer of IrO2-SnO2-Sb2O5 in preventing insulating titanium oxide formation on titanium substrate for the oxygen evolution Mn1-x-yMoxSnyO2+x anodes in electrolysis of 0.5 M NaCl of pH 1 at 1000 A.m-2. Effects of antimony and iridium in the intermediate IrO2-SnO2-Sb2O5 layer are discussed. The 75 % of the iridium content in the intermediate layer of the oxygen evolution anodes can be substituted by SnO2 and small amount of Sb2O5 to increase the electronic conductivity of the intermediate layer as well as the activity of the Mn1-x-yMoxSnyO2+x/IrO2-SnO2-Sb2O5/Ti anodes for seawater electrolysis at pH 1. Although Sb5+ addition is effective in decreasing the Ir4+ concentration in the intermediate layer of the anodes, the Ir1-x-ySnxSbyO2+0.5y intermediate layers with the Sb5+/Sn4+ between 0.125-0.285 in the coating solution showed excellent performance of the oxygen evolution efficiency. All the examined manganese-molybdenum-tin triple oxides, Mn1-x-yMoxSnyO2+x, prepared by anodic deposition on the IrO2-SnO2-Sb2O5-coated titanium substrate showed around 99% initial oxygen evolution efficiency at a current density of 1000 A.m-2 in 0.5 M NaCl of pH 1 at 25ºC.Keywords: global CO2 recycling, hydrogen production electrode, IrO2-SnO2-Sb2O5 layer, 0.5 M NaCl, titanium substrate.DOI: 10.3126/jncs.v23i0.2093J. Nepal Chem. Soc., Vol. 23, 2008/2009Page: 21-32

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Growth of GaN on Si(111) Substrates via a Reactive-Sputter-Deposited AlN Intermediate Layer

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.08jb16 ◽

2013 ◽

Vol 52 (8S) ◽

pp. 08JB16 ◽

Cited By ~ 9

Author(s):

Takaya Yamada ◽

Tomoyuki Tanikawa ◽

Yoshio Honda ◽

Masahito Yamaguchi ◽

Hiroshi Amano

Keyword(s):

Intermediate Layer ◽

Sputter Deposited ◽

Gan On Si

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DIAMOND DEPOSITION ON WC/Co ALLOY WITH A MOLYBDENUM INTERMEDIATE LAYER

Surface Review and Letters ◽

10.1142/s0218625x05007335 ◽

2005 ◽

Vol 12 (04) ◽

pp. 499-504

Author(s):

SHA LIU ◽

ZHI-MING YU ◽

DAN-QING YI

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Intermediate Layer ◽

Diamond Films ◽

Chemical Vapor ◽

Cvd Diamond ◽

Diamond Growth ◽

Diamond Coatings ◽

Sputter Deposited ◽

Diamond Grain

It is known that in the condition of chemical vapor deposition (CVD) diamond process, molybdenum is capable of forming carbide known as the "glue" which promotes growth of the CVD diamond, and aids its adhesion by (partial) relief of stresses at the interface. Furthermore, the WC grains are reaction bonded to the Mo 2 C phase. Therefore, molybdenum is a good candidate material for the intermediate layer between WC–Co substrates and diamond coatings. A molybdenum intermediate layer of 1–3 μm thickness was magnetron sputter-deposited on WC/Co alloy prior to the deposition of diamond coatings. Diamond films were deposited by hot filament chemical vapor deposition (HFCVD). The chemical quality, morphology, and crystal structure of the molybdenum intermediate layer and the diamond coatings were characterized by means of SEM, EDX, XRD and Raman spectroscopy. It was found that the continuous Mo intermediate layer emerged in spherical shapes and had grain sizes of 0.5–1.5 μm after 30 min sputter deposition. The diamond grain growth rate was slightly slower as compared with that of uncoated Mo layer on the WC–Co substrate. The morphologies of the diamond films on the WC–Co substrate varied with the amount of Mo and Co on the substrate. The Mo intermediate layer was effective to act as a buffer layer for both Co diffusion and diamond growth.

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The effect of Al intermediate layer on thermal resistance of EB-PVD yttria-stabilized zirconia coatings on titanium substrate

10.1063/1.5013847 ◽

2017 ◽

Author(s):

Alexey Panin ◽

Victor Panin ◽

Marina Kazachenok ◽

Artur Shugurov ◽

Elena Sinyakova ◽

...

Keyword(s):

Thermal Resistance ◽

Intermediate Layer ◽

Titanium Substrate ◽

Yttria Stabilized Zirconia ◽

Stabilized Zirconia

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The Development of the Intermediate SnO2–Sb2O5 Layer on Titanium Substrate for Oxygen Evolution Anodes in Seawater Electrolysis

Journal of Nepal Chemical Society ◽

10.3126/jncs.v23i0.2097 ◽

1970 ◽

Vol 23 ◽

pp. 54-64

Author(s):

Jagadeesh Bhattarai

Keyword(s):

Oxygen Evolution ◽

Intermediate Layer ◽

Electronic Conductivity ◽

Titanium Substrate ◽

Coating Solution ◽

High Electronic Conductivity ◽

Initial Oxygen ◽

Co2 Recycling ◽

The Stability ◽

Seawater Electrolysis

An attempt is made to replace the use of IrO2 by SnO2–Sb2O5 in the intermediate layer which is necessary to avoid the growth of insulating titanium oxide on the titanium substrate for oxygen evolution γ-MnO2 type Mn1-x-yMoxSnyO2+x anodes in seawater electrolysis. The manganese–molybdenum–tin triple oxides, Mn1-x-yMoxSnyO2+x, prepared by anodic deposition on the SnO2–Sb2O5-coated titanium substrate from MnSO4, Na2MoO4 and SnCl4 solutions showed around 98.6% initial oxygen evolution efficiency at a current density of 1000 Am-2 in 0.5 M NaCl of pH 1 at room temperature. In order to increase the stability of the anodes, coating at various times to form the intermediate SnO2–Sb2O5 layer with sufficient thickness on titanium substrate, was performed. The Mn1-x-yMoxSnyO2+x electrodes deposited on the intermediate layer formed from seven times coating showed about 98% oxygen evolution efficiency after 20 h electrolysis. A small addition of Sb2O5 to the intermediate layer (that is, Sb5+/Sn4+ = 0.124 in the coating solution) seems to be more effective to replace the use of IrO2 for high electronic conductivity and activity of oxygen evolution in seawater electrolysis. The formation of the double oxides of the intermediate SnO2–Sb2O5 layer after seven times coating seemed responsible for both high conductivity and stability of the Mn1-x-yMoxSnyO2+x anodes.Keywords: CO2 recycling, oxygen evolution electrode, intermediate SnO2–Sb2O5 layer, seawater electrolysis, titanium substrate.DOI: 10.3126/jncs.v23i0.2097J. Nepal Chem. Soc., Vol. 23, 2008/2009 Page: 54-64

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Effects of Antimony and Tin Additions in the Intermediate Ir1-x-y SnxSbyO2+0.5y Layer of Mn–Mo–Sn–O Electrocatalyst for Hydrogen Production from Seawater Electrolysis

Journal of Nepal Chemical Society ◽

10.3126/jncs.v27i1.6665 ◽

2012 ◽

Vol 27 ◽

pp. 78-85

Author(s):

Jagadeesh Bhattarai

Keyword(s):

Oxygen Evolution ◽

Intermediate Layer ◽

Electronic Conductivity ◽

Titanium Substrate ◽

Oxygen Production ◽

Oxide Formation ◽

Intermediate Layers ◽

High Electronic Conductivity ◽

Alternative Materials ◽

Seawater Electrolysis

The oxygen production anode for seawater electrolysis is composed of two layers on the titanium substrate. The outermost layer is electrocatalysts of ?-MnO2 type Mn1-x-yMoxSnyO2+x triple oxides and the intermediate layer preventing insulating oxide formation on the titanium substrate is generally IrO2. Due to limited amount of iridium, alternative materials to the intermediate IrO2 having sufficient durability and conductivity at high potentials for anodic polarization are required. In this context, decrease in the amount of IrO2 by substitution with SnO2 and increase in the electronic conductivity of the intermediate layer by Sb2O5 addition is performed in this works. The additions of SnO2 with Sb2O5 to the intermediate layer of the Mn-Mo-Sn-O/Ir1–x–ySnxSbyO2+0.5y/Ti anodes was effective to decrease the use of IrO2, maintaining the high electronic conductivity of the intermediate Ir1–x–ySnxSbyO2+0.5y layer and the high activity of oxygen evolution in seawater electrolysis at pH 1 for about 1550 h. The oxygen evolution efficiency of the nanocrystalline ?-MnO2 type Mn-Mo-Sn-O/Ir1–x–ySnxSbyO2+0.5y/Ti anodes with 0.208 M Ir4+, 0.208-0.416 M Sn4+ and 0.104 M Sb5+ in the intermediate layers was about 98.5 % during electrolysis for about 1550 hours without any degradation in 0.5 M NaCl solution of pH 1 at 25°C.DOI: http://dx.doi.org/10.3126/jncs.v27i1.6664 J. Nepal Chem. Soc., Vol. 27, 2011 78-85

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Deposition of Diamond onto a Titanium Substrate using a Molybdenum Intermediate Layer

Chemical Vapor Deposition ◽

10.1002/cvde.201307063 ◽

2013 ◽

Vol 19 (7-8-9) ◽

pp. 284-289 ◽

Cited By ~ 3

Author(s):

Mubarak Ali ◽

Mustafa Ürgen ◽

Ishtiaq A. Qazi

Keyword(s):

Intermediate Layer ◽

Titanium Substrate

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Crystal Structure Analysis of Cu-Zr Alloys by Convergent Beam Diffraction

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100098277 ◽

1981 ◽

Vol 39 ◽

pp. 354-355

Author(s):

A. F. Marshall ◽

J. W. Steeds ◽

D. Bouchet ◽

S. L. Shinde ◽

R. G. Walmsley

Keyword(s):

Crystal Structure ◽

Point Group ◽

Intermetallic Phase ◽

Three Dimensional ◽

Crystal Structure Analysis ◽

Ion Milling ◽

Composition And Structure ◽

Unit Cells ◽

Sputter Deposited ◽

Convergent Beam

Convergent beam electron diffraction is a powerful technique for determining the crystal structure of a material in TEM. In this paper we have applied it to the study of the intermetallic phases in the Cu-rich end of the Cu-Zr system. These phases are highly ordered. Their composition and structure has been previously studied by microprobe and x-ray diffraction with sometimes conflicting results.The crystalline phases were obtained by annealing amorphous sputter-deposited Cu-Zr. Specimens were thinned for TEM by ion milling and observed in a Philips EM 400. Due to the large unit cells involved, a small convergence angle of diffraction was used; however, the three-dimensional lattice and symmetry information of convergent beam microdiffraction patterns is still present. The results are as follows:1) 21 at% Zr in Cu: annealed at 500°C for 5 hours. An intermetallic phase, Cu3.6Zr (21.7% Zr), space group P6/m has been proposed near this composition (2). The major phase of our annealed material was hexagonal with a point group determined as 6/m.

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Characterization of reactive phase formation in sputter-deposited Ni/Al multilayer thin films using TEM

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100167469 ◽

1996 ◽

Vol 54 ◽

pp. 1000-1001

Author(s):

G. Lucadamo ◽

K. Barmak ◽

C. Michaelsen

Keyword(s):

Thin Films ◽

Phase Formation ◽

Dark Field ◽

Nickel Layer ◽

Multilayer Thin Films ◽

Cross Sectional ◽

Dark Field Imaging ◽

Transmission Electron ◽

Sputter Deposited ◽

Constant Heating

The subject of reactive phase formation in multilayer thin films of varying periodicity has stimulated much research over the past few years. Recent studies have sought to understand the reactions that occur during the annealing of Ni/Al multilayers. Dark field imaging from transmission electron microscopy (TEM) studies in conjunction with in situ x-ray diffraction measurements, and calorimetry experiments (isothermal and constant heating rate), have yielded new insights into the sequence of phases that occur during annealing and the evolution of their microstructure.In this paper we report on reactive phase formation in sputter-deposited lNi:3Al multilayer thin films with a periodicity A (the combined thickness of an aluminum and nickel layer) from 2.5 to 320 nm. A cross-sectional TEM micrograph of an as-deposited film with a periodicity of 10 nm is shown in figure 1. This image shows diffraction contrast from the Ni grains and occasionally from the Al grains in their respective layers.

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