scholarly journals Effect of C2H2/N2 partial pressure ratio on microstructure and mechanical properties of Ti-Al-Si-C-N coatings

2019 ◽  
Vol 365 ◽  
pp. 200-207 ◽  
Author(s):  
Jiabin Gu ◽  
Liuhe Li ◽  
Hu Miao ◽  
Yi Xu ◽  
Ye Xu ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Partial Pressure ◽  
Pressure Ratio ◽  
Microstructure And Mechanical Properties ◽  
Partial Pressure Ratio

Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering

2011 ◽  
Vol 686 ◽  
pp. 589-594 ◽  
Author(s):  
Sheng Lu ◽  
Liang Wen Wu ◽  
Jing Chen
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Partial Pressure ◽  
Pressure Ratio ◽  
X Ray Diffraction ◽  
X Ray ◽  
Microstructure And Properties ◽  
Az91d Magnesium Alloy ◽  
Hydrophobic Nature ◽  
Partial Pressure Ratio

By means of reaction magnetron sputtering, TiAlN ternary compound films were deposited on AZ91D magnesium alloy substrates. The influence of partial pressure ratio of N2 to Ar (N2/Ar) on the microstructure and properties of TiAlN film was explored with scanning electron microscopy (SEM), X-ray diffraction (XRD), and tests of microhardness, hydrophile and corrosion resistance. The results show that with the increase of N2/Ar partial pressure ratio from 0.5:10 to 1.5:10, Ti2N becomes the main film phase and the size of the crystals cluster decreases. As the N2/Ar ratio is as higher as 2:10, the film crystals change from Ti2N to TiN with coarse clusters. With increase of N2/Ar rate, the hardness, hydrophobic nature and corrosion resistance of the TiAlN film tend to increase.

scholarly journals Growth Properties of Sputtered ZnO Thin Films Affected by Oxygen Partial Pressure Ratio

2008 ◽  
Vol 17 (3) ◽  
pp. 204-210 ◽  
Author(s):  
Man-Il Kang ◽  
Moon-Won Kim ◽  
Yong-Gi Kim ◽  
Ji-Wook Ryu ◽  
Han-O Jang
Keyword(s):  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Pressure Ratio ◽  
Zno Thin Films ◽  
Growth Properties ◽  
Partial Pressure Ratio
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