Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering

Materials ◽

10.3390/ma11010131 ◽

2018 ◽

Vol 11 (1) ◽

pp. 131 ◽

Author(s):

Monika Kwoka ◽

Barbara Lyson-Sypien ◽

Anna Kulis ◽

Monika Maslyk ◽

Michal Borysiewicz ◽

...

Keyword(s):

Magnetron Sputtering ◽

Surface Properties ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron

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Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2004.06.159 ◽

2005 ◽

Vol 473 (1) ◽

pp. 58-62 ◽

Author(s):

Ruijin Hong ◽

Hongji Qi ◽

Jianbing Huang ◽

Hongbo He ◽

Zhengxiu Fan ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

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Temperature-dependent growth and properties of W-doped ZnO thin films deposited by reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2013.03.069 ◽

2013 ◽

Vol 274 ◽

pp. 371-377 ◽

Author(s):

Chi Zhang ◽

Xin-liang Chen ◽

Xin-hua Geng ◽

Cong-sheng Tian ◽

Qian Huang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron ◽

Temperature Dependent ◽

Doped Zno ◽

Dependent Growth

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Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.035 ◽

2016 ◽

Vol 601 ◽

pp. 106-110 ◽

Author(s):

Aleksandras Iljinas ◽

Vytautas Stankus

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Bismuth Ferrite ◽

Ferroelectric Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Ferrite Thin Films

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Blue shift of optical band gap in Er-doped ZnO thin films deposited by direct current reactive magnetron sputtering technique

Physica E Low-dimensional Systems and Nanostructures ◽

10.1016/j.physe.2010.01.029 ◽

2010 ◽

Vol 42 (5) ◽

pp. 1713-1716 ◽

Author(s):

Y. Chen ◽

X.L. Xu ◽

G.H. Zhang ◽

H. Xue ◽

S.Y. Ma

Keyword(s):

Magnetron Sputtering ◽

Band Gap ◽

Direct Current ◽

Optical Band Gap ◽

Zno Thin Films ◽

Reactive Magnetron ◽

Doped Zno ◽

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Effects of oxygen partial pressure on resistive switching characteristics of ZnO thin films by DC reactive magnetron sputtering

Solid State Communications ◽

10.1016/j.ssc.2010.07.032 ◽

2010 ◽

Vol 150 (39-40) ◽

pp. 1919-1922 ◽

Author(s):

Zhenguo Ji ◽

Qinan Mao ◽

Weiqing Ke

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Resistive Switching ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering ◽

Switching Characteristics

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Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.05.095 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5762-5768 ◽

Author(s):

Hetal N. Shah ◽

R. Jayaganthan ◽

Davinder Kaur ◽

Ramesh Chandra

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Steel Substrate ◽

Reactive Magnetron Sputtering ◽

Chromium Nitride ◽

Reactive Magnetron

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Optical and structural characterization of Tm2O3, TmN, and TmOxNy thin films grown by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138450 ◽

2021 ◽

Vol 717 ◽

pp. 138450

Author(s):

Axel Meeuwissen ◽

Giacomo B.F. Bosco ◽

Erik van der Kolk

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Structural Characterization ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.06.278 ◽

2016 ◽

Vol 688 ◽

pp. 44-50 ◽

Author(s):

Tong Zhou ◽

Dawei Liu ◽

Ying Zhang ◽

Taoyuan Ouyang ◽

Jinping Suo

Keyword(s):

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Optical properties of ZnO thin films deposited by dc reactive magnetron sputtering

Vacuum ◽

10.1016/0042-207x(93)90357-g ◽

1993 ◽

Vol 44 (2) ◽

pp. 105-109 ◽

Author(s):

Li-jian Meng ◽

M Andritschky ◽

MP dos Santos

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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