Investigation on the structural and mechanical properties of anti-sticking sputtered tungsten chromium nitride films

2013 ◽  
Vol 529 ◽  
pp. 333-337 ◽  
Author(s):  
Tai-Nan Lin ◽  
Sheng Han ◽  
Ko-Wei Weng ◽  
Chin-Tan Lee
Keyword(s):  
Mechanical Properties ◽  
Chromium Nitride

Influence of the ion–atom flux ratio on the mechanical properties of chromium nitride thin films

Vacuum ◽  
2007 ◽  
Vol 81 (5) ◽  
pp. 610-618 ◽  
Author(s):  
J.J. Olaya ◽  
G. Wei ◽  
S.E. Rodil ◽  
S. Muhl ◽  
B. Bhushan
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Flux Ratio ◽  
Chromium Nitride ◽  
Atom Flux

Structure and Mechanical Properties of Titanium Nitride, Zirconium Nitride, and Chromium Nitride Films by Reactive Magnetron-Sputter Deposition

1996 ◽  
Vol 458 ◽  
Author(s):  
W.-H. Soe ◽  
T. Kitagaki ◽  
H. Ueda ◽  
N. Shima ◽  
M. Otsuka ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Sputter Deposition ◽  
Zirconium Nitride ◽  
Chromium Nitride ◽  
Reactive Magnetron ◽  
Nano Indentation ◽  
Low Load ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Hardness Values

ABSTRACTTiN, ZrN, and CrN films were grown by reactive magnetron sputtering on WC-Co sintered hard alloy substrates. Hardness and elastic modulus were measured by nano-indentation tester with low load on tip at 200 mgf. Hardness values were shown the higher value the thinner film thickness due to stress in the films.

Structural, electronic and mechanical properties ofCrN: A first principles study

2015 ◽  
Vol 29 (04) ◽  
pp. 1550009 ◽  
Author(s):  
Zhu Ming ◽  
Ke-Hong Wang
Keyword(s):  
Mechanical Properties ◽  
First Principles ◽  
Electronic Band Structure ◽  
Chromium Nitride ◽  
First Principles Calculations ◽  
Generalized Gradient ◽  
Electronic Band ◽  
Zinc Blende ◽  
Nias Type Structure ◽  
Nias Type

The structural stability, electronic, and mechanical properties of chromium nitride ( CrN ) have been investigated by first-principles calculations within the generalized gradient approximation (GGA). Six different crystal structures of CrN are considered, namely NaCl , CsCl , zinc blende, WC, wurtzite and NiAs . Among the considered structures, NiAs -type structure is energetically more stable than others. The electronic band structure and density of states calculations reveal that these materials exhibit metallic nature. The calculated elastic constants indicate these compounds are mechanically stable in all the considered sturctures. In addition, the related mechanical properties such as bulk modulus, Young's modulus, shear modulus and the Poisson's ratio are also computed.

Si Doped and Un-Doped CrN Thin Films Produced by Magnetron Sputtering: Structural and Mechanical Properties

2012 ◽  
Vol 18-19 ◽  
pp. 201-211 ◽  
Author(s):  
L. Cunha ◽  
C. Moura
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Crystallite Size ◽  
Processing Parameters ◽  
Preferred Orientation ◽  
Chromium Nitride ◽  
Face Centered Cubic ◽  
Face Centered ◽  
Silicon Doped

Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering. The effect of processing parameters on the properties of chromium nitride films and the correspondent influence of the addition of silicon on the chromium nitride matrix in the films structure and mechanical properties have been investigated. The characterization of the coatings was performed by X-ray diffraction (XRD), and nano-indentation experiments. These studies allow analyzing the crystalline phases, crystal orientation/texture, crystallite size, mechanical properties and the relations between the characteristics of the films. The increase of the nitrogen partial pressure in the working atmosphere produces changes from a body-centered cubic (bcc) Cr structure, to hexagonal Cr2N to face-centered cubic (fcc) CrN structure, with CrN (111) preferred orientation. For the films with a dominant Cr2N phase the hardness has a relative maximum (42 GPa). The highest hardness was measured for a coating with dominant CrN phase (45 GPa) with a crystallite size around 18 nm. The addition of Si, in the films with CrN dominant phase, maintains the CrN (111) preferred orientation and produced variable changes in films hardness, depending on deposition conditions.

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