Cu(InGa)Se2 absorber formation by in-situ, low-temperature annealing of co-evaporated bilayer (InGa)2Se3/CuSe precursors

2015 ◽  
Vol 596 ◽  
pp. 63-67 ◽  
Author(s):  
Kyeongchan Moon ◽  
Woo Kyoung Kim
Keyword(s):  
Low Temperature ◽  
Low Temperature Annealing

Effect of in situ low-temperature annealing on anomalous Hall effect in Co nanocluster-assembled granular film

2018 ◽  
Vol 748 ◽  
pp. 922-928
Author(s):  
Q.F. Zhang ◽  
L.S. Wang ◽  
H.F. Zheng ◽  
A.M. Su ◽  
X. Liu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Hall Effect ◽  
Anomalous Hall Effect ◽  
Granular Film ◽  
Low Temperature Annealing

Low Temperature Annealing of Rh (111) Surfaces

1996 ◽  
Vol 440 ◽  
Author(s):  
Frank Tsui ◽  
Joanne Wellman ◽  
Junhao Xu ◽  
Ctirad Uher ◽  
Roy Clarke
Keyword(s):  
Low Temperature ◽  
Temperature Stability ◽  
High Energy ◽  
Scanning Tunneling ◽  
Initial Surface ◽  
Tunneling Microscopy ◽  
Homoepitaxial Growth ◽  
Low Temperature Annealing ◽  
Kinetics Of

AbstractWe have studied smoothing kinetics of Rh (111) surfaces during low temperature annealing using in-situ real-time reflection high energy electron diffraction and scanning tunneling microscopy. The initial surface features were produced by low temperature homoepitaxial growth of Rh (111). Two types of surfaces were studied, surfaces with two-dimensional (2D) islands at submonolayer coverages, and those with 3D multilayered features. 2D islands coarsen rapidly at the onset of the anneal. 3D features are more stable initially. Their annealing process exhibits a distinct transition from an initial slow coarsening, characterized by a nearly linear growth of lateral size, to a rapid flattening. The activation energy for the transition is ˜ 0.6 eV. The observed behavior indicates that the smoothing kinetics in the low temperature regime is limited by adatom detachment from the step-edges, and that the fast process for the 3D features is made possible by the formation of a network of “chain-like” structures which provide new pathways for diffusion thus overcoming the slow detachment kinetics. These effects determine the low temperature stability of the non-equilibrium epitaxial morphologies.

In situ Tensile Experiments at Low Temperatures on Niobium Single Crystals by H.V.E.M.

1975 ◽  
Vol 33 ◽  
pp. 58-59
Author(s):  
F. H. Louchet ◽  
L. P. Kubin
Keyword(s):  
Electron Microscope ◽  
Transition Temperature ◽  
Low Temperature ◽  
Slip System ◽  
Low Temperatures ◽  
Tensile Axis ◽  
Image Intensifier ◽  
Screw Dislocations ◽  
Source Operation

Experiments have been carried out on the 3 MeV electron microscope in Toulouse. The low temperature straining holder has been previously described Images given by an image intensifier are recorded on magnetic tape.The microtensile niobium samples are cut in a plane with the two operative slip directions [111] and lying in the foil plane. The tensile axis is near [011].Our results concern:- The transition temperature of niobium near 220 K: at this temperature and below an increasing difference appears between the mobilities of the screw and edge portions of dislocations loops. Source operation and interactions between screw dislocations of different slip system have been recorded.

Role of boundaries in the crystallization of amorphous films

1988 ◽  
Vol 46 ◽  
pp. 626-627
Author(s):  
D. A. Smith
Keyword(s):  
Low Temperature ◽  
Amorphous State ◽  
Nucleation And Growth ◽  
Amorphous Films ◽  
Island Nucleation ◽  
Surface Steps ◽  
Transmission Electron ◽  
Component Systems ◽  
Temperature Deposition

The nucleation and growth processes which lead to the formation of a thin film are particularly amenable to investigation by transmission electron microscopy either in situ or subsequent to deposition. In situ studies have enabled the observation of island nucleation and growth, together with addition of atoms to surface steps. This paper is concerned with post-deposition crystallization of amorphous alloys. It will be argued that the processes occurring during low temperature deposition of one component systems are related but the evidence is mainly indirect. Amorphous films result when the deposition conditions such as low temperature or the presence of impurities (intentional or unintentional) preclude the atomic mobility necessary for crystallization. Representative examples of this behavior are CVD silicon grown below about 670°C, metalloids, such as antimony deposited at room temperature, binary alloys or compounds such as Cu-Ag or Cr O2, respectively. Elemental metals are not stable in the amorphous state.

Low-temperature annealing of YBa2Cu3O7-x

1992 ◽  
Vol 50 (1) ◽  
pp. 88-89
Author(s):  
R.L. Sabatini ◽  
Yimei Zhu ◽  
Masaki Suenaga ◽  
A.R. Moodenbaugh
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Oxygen Diffusion ◽  
Diffusion Rate ◽  
Oxygen Depletion ◽  
Low Temperature Annealing ◽  
Transmission Electron ◽  
Microstructural Effects ◽  
Oxygen Diffusion Rate

Low temperature annealing (<400°C) of YBa2Cu3O7x in a ozone containing oxygen atmosphere is sometimes carried out to oxygenate oxygen deficient thin films. Also, this technique can be used to fully oxygenate thinned TEM specimens when oxygen depletion in thin regions is suspected. However, the effects on the microstructure nor the extent of oxygenation of specimens has not been documented for specimens exposed to an ozone atmosphere. A particular concern is the fact that the ozone gas is so reactive and the oxygen diffusion rate at these temperatures is so slow that it may damage the specimen by an over-reaction. Thus we report here the results of an investigation on the microstructural effects of exposing a thinned YBa2Cu3O7-x specimen in an ozone atmosphere using transmission electron microscopy and energy loss spectroscopy techniques.

scholarly journals Insight into the Promoting Role of Er Modification on SO2 Resistance for NH3-SCR at Low Temperature over FeMn/TiO2 Catalysts

Catalysts ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 618
Author(s):  
Huan Du ◽  
Zhitao Han ◽  
Xitian Wu ◽  
Chenglong Li ◽  
Yu Gao ◽  
...  
Keyword(s):  
Low Temperature ◽  
Catalyst Surface ◽  
Impregnation Method ◽  
In Situ Drifts ◽  
Tio2 Catalyst ◽  
Nh3 Scr ◽  
Nh3 Adsorption ◽  
So2 Resistance ◽  
Fast Scr

Er-modified FeMn/TiO2 catalysts were prepared through the wet impregnation method, and their NH3-SCR activities were tested. The results showed that Er modification could obviously promote SO2 resistance of FeMn/TiO2 catalysts at a low temperature. The promoting effect and mechanism were explored in detail using various techniques, such as BET, XRD, H2-TPR, XPS, TG, and in-situ DRIFTS. The characterization results indicated that Er modification on FeMn/TiO2 catalysts could increase the Mn4+ concentration and surface chemisorbed labile oxygen ratio, which was favorable for NO oxidation to NO2, further accelerating low-temperature SCR activity through the “fast SCR” reaction. As fast SCR reaction could accelerate the consumption of adsorbed NH3 species, it would benefit to restrain the competitive adsorption of SO2 and limit the reaction between adsorbed SO2 and NH3 species. XPS results indicated that ammonium sulfates and Mn sulfates formed were found on Er-modified FeMn/TiO2 catalyst surface seemed much less than those on FeMn/TiO2 catalyst surface, suggested that Er modification was helpful for reducing the generation or deposition of sulfate salts on the catalyst surface. According to in-situ DRIFTS the results of, the presence of SO2 in feeding gas imposed a stronger impact on the NO adsorption than NH3 adsorption on Lewis acid sites of Er-modified FeMn/TiO2 catalysts, gradually making NH3-SCR reaction to proceed in E–R mechanism rather than L–H mechanism. DRIFTS.

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