Low-temperature plasma annealing of sputtered indium tin oxide for transparent and conductive thin-films on glass and polymer substrates

2020 ◽  
Vol 693 ◽  
pp. 137715 ◽  
Author(s):  
Eric Klein ◽  
Kilian Huber ◽  
Oliver Paul ◽  
Patrick Ruther
2020 ◽  
Vol 6 ◽  
pp. 40-55
Author(s):  
N.M. Ivanova ◽  
◽  
E.O. Filippova ◽  
A.N. Aleinik ◽  
V.F. Pichugin ◽  
...  

Effects of the low-temperature plasma exposure, γ-irradiation, and joint g-irradiation and plasma exposure on the structure and surface properties of thin films based on polylactic acid (PLA) have been investigated. Films were obtained by the method a solvent-casting. It has been shown that films based on polylactic acid have topographically different sides: a smoother inner side and embossed outer one. PLA films have properties close to those hydrophobic, with a contact angle in the range of 70°-73° regardless of the surface side and belong to a weakly polar materials. The combined effect of plasma and gamma radiation slightly changes the surface topography. The effect of low-temperature plasma on the surface of the films leads to a decrease in the contact angle by 13°-55° (9-11%) and an increase in surface energy due to the polar component. The results of in vivo experiments on rabbits are presented. Biomicroscopy, optical coherence tomography, morphological and electron microscopic examination of the cornea after implantation of initial and radiation and plasma treated films showed that implantation of the films in the anterior chamber is not accompanied by a pronounced inflammatory reaction and increased intraocular pressure, while maintaining the morphological structure of the cornea almost unchanged.


2021 ◽  
Author(s):  
Longfei Song ◽  
Tony Schenk ◽  
Emmanuel Defay ◽  
Sebastjan Glinsek

Highly conductive (conductivity 620 S cm−1) and transparent ITO thin films are achieved at low temperature (350 °C) through effective combustion solution processing via multistep coating. The properties show potential for next generation flexible and transparent electronics.


2021 ◽  
Vol 93 ◽  
pp. 423-429
Author(s):  
Vivekanandan Raman ◽  
Yong-Hwan Cho ◽  
Jin-Hyeok Park ◽  
Deviprasath Chinnadurai ◽  
Han-Ki Kim

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