The evolution of the structural, electrical and optical properties in indium-tin-oxide thin film on glass substrate by DC reactive magnetron sputtering

Vacuum ◽  
2006 ◽  
Vol 80 (8) ◽  
pp. 880-887 ◽  
Author(s):  
Ho-Chul Lee ◽  
O. Ok Park
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Glass Substrate ◽  
Oxide Thin Film ◽  
Reactive Magnetron ◽  
Electrical And Optical Properties ◽  
Dc Reactive Magnetron Sputtering

ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS PREPARED BY R.F. MAGNETRON SPUTTERING

2011 ◽  
Vol 25 (20) ◽  
pp. 2741-2749 ◽  
Author(s):  
J. C. ZHOU ◽  
L. LI ◽  
L. Y. RONG ◽  
B. X. ZHAO ◽  
Y. M. CHEN ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Sputtering Power

High transparency and conductivity of transparent conducting oxide thin film are very important for improving the efficiency of solar cells. ZnO thin film is a better candidate for transparent conductive layer of solar cell. N-type ZnO thin films were prepared by radio-frequency magnetron sputtering on glass substrates. ZnO thin films underwent annealing treatment after deposition. The influence of the sputtering power on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV2450 and HMS-3000. The experimental results indicate that the crystal quality of ZnO thin film is improved and all films show higher c-axis orientation with increasing sputtering power from 50 to 125 W. The average transparency of ZnO thin films is higher than 90% in the range of 400–900 nm between the sputtering power of 50–100 W. After the rapid thermal annealing at 550°C for 300 s under N2 ambient, the minimum resistivity reach to 10-2Ω⋅ cm .

Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide

1997 ◽  
Vol 36 (Part 1, No. 7B) ◽  
pp. 4922-4927 ◽  
Author(s):  
Yoshinobu Matsuda ◽  
Yasunari Yamori ◽  
Madoka Muta ◽  
Shinichi Ohgushi ◽  
Hiroshi Fujiyama
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Plasma Parameters ◽  
Film Properties ◽  
Dc Reactive Magnetron Sputtering
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