Characteristics of Fast ion beam in Neon and Argon filled plasma focus correlated with Lee Model Code

Vacuum ◽  
2019 ◽  
Vol 169 ◽  
pp. 108916
Author(s):  
V. Damideh ◽  
O.H. Chin ◽  
S.H. Saw ◽  
P.C.K. Lee ◽  
R.S. Rawat ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Ion Beam ◽  
Lee Model Code ◽  
Lee Model ◽  
Model Code ◽  
Fast Ion

Determination of Ion Beam Properties In Nitrogen and Helium Using Mather Type Plasma Focus Device

2014 ◽  
Vol 71 (5) ◽  
Author(s):  
Someraa Saleh Shakonah ◽  
Jalil Ali ◽  
Natashah Abd. Rashid ◽  
Kashif Chaudhary
Keyword(s):  
Plasma Focus ◽  
Beam Energy ◽  
Ion Beam ◽  
Beam Current ◽  
Plasma Focus Device ◽  
Lee Model Code ◽  
Beam Source ◽  
Model Code ◽  
Pressure Regime

Some of ion beam properties have been investigated by using Lee model code on plasma focus devices which is operated with nitrogen and helium gases. The operation of plasma focus in different pressure regime gives a consistent ion beam properties which can make the plasma focus a reliable ion beam source .These ion beam properties such as ion beam flux, ion beam fluence, ion beam energy, ion beam current, and beam ion number corresponding to gas pressure have been studied for Mather type plasma focus device. The result shows the differences between helium as lighter gas and nitrogen as heavier gas in term of ion beam properties. The fluence and flux are decrease for nitrogen while increase for helium. 

scholarly journals Comparison of measured pinch parameters versus pressure for SABALAN1 plasma focus facility against computed values using Lee model code

AIP Advances ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 075209 ◽  
Author(s):  
F. S. Karimi ◽  
S. Saviz ◽  
M. Ghoranneviss ◽  
M. K. Salem ◽  
F. M. Aghamir
Keyword(s):  
Plasma Focus ◽  
Lee Model Code ◽  
Lee Model ◽  
Model Code

scholarly journals Application of Lee Model Curve on Fitting of Discharge Current Curve of Plasma Focus Device

2021 ◽  
Vol 1 (1) ◽  
pp. 47-56
Author(s):  
Prakash Gautam
Keyword(s):  
Plasma Focus ◽  
Numerical Experiments ◽  
Electrical Circuit ◽  
Model Parameters ◽  
Lee Model Code ◽  
Lee Model ◽  
Model Code ◽  
Current Curve ◽  
Computer Based ◽  
Current Trace

A dense plasma focus is a table top machine producing a short-lived extremely popular plasma and cause fusion. Lee Model Code is a computer-based visual basic simulation package, which was successfully utilized in the plasma focus devices. The dynamics of plasma focus discharge is quite complicated, so to review and simplify the complication Lee Model couples electrical circuit with the plasma focus dynamics, radiation and therefore the thermodynamics. This enables us to simulate all of the gross focus properties. In this paper the numerical experiments are carried out to compute the current trace as a function of time for plasma focus (PF) device NX2. Results obtained by the numerical experiments are compared with the published laboratory measured data. This current fitting is completed to get the model parameters.

Fast Faraday cup for fast ion beam TOF measurements in deuterium filled plasma focus device and correlation with Lee model

2017 ◽  
Vol 24 (6) ◽  
pp. 063302 ◽  
Author(s):  
Vahid Damideh ◽  
Jalil Ali ◽  
Sor Heoh Saw ◽  
Rajdeep Singh Rawat ◽  
Paul Lee ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Ion Beam ◽  
Plasma Focus Device ◽  
Faraday Cup ◽  
Lee Model ◽  
Fast Ion

scholarly journals Modelling and Electrical Characteristics of the Thailand Plasma Focus-II (TPF-II)

2017 ◽  
Vol 15 (6) ◽  
pp. 471-480
Author(s):  
Arlee TAMMAN ◽  
Mudtorlep NISOA ◽  
Boonchoat PAOSAWATYANYONG ◽  
Dheerawan BOONYAWAN ◽  
Nopporn POOLYARAT ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Initial Conditions ◽  
Ion Beam ◽  
Short Circuit ◽  
Electrical Current ◽  
High Energy ◽  
Heating Process ◽  
Lee Model Code ◽  
Model Code ◽  
Short Circuit Test

The Thailand Plasma Focus II (TPF-II) is a 3.3 kJ dense plasma focus that was developed at Walailak University, Thailand. The aim of the device is to study the production of ion beams in the keV energy range and their applications for the color modification of gemstones. A high-energy ion beam is produced by heating and acceleration in the pinch phase of the plasma focus. The heating process is determined by the maximum electrical current, which can be optimized by variation of the system’s inductance. Lee model code was implemented to optimize the configuration of the electrodes. The current waveforms for the different initial conditions were used to obtain the system’s inductance, which was verified by a short circuit test. It was found that the inductance and resistance were about 153 nH and 12 mΩ, respectively.

scholarly journals A 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabrication

2014 ◽  
Vol 32 ◽  
pp. 1460322 ◽  
Author(s):  
S. H. Saw ◽  
V. Damideh ◽  
P. L. Chong ◽  
P. Lee ◽  
R. S. Rawat ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Numerical Experiments ◽  
Ion Beam ◽  
Reactor Wall ◽  
Materials Testing ◽  
Nano Materials ◽  
Large Area ◽  
Lee Model Code ◽  
3D Design ◽  
Model Code

This paper summarizes PF-160 Dual Plasma Focus (DuPF) numerical experiments using the Lee Model code and preliminary 3D design drawings using SolidWorks software. This DuPF consists of two interchangeable electrodes enabling it to be optimized for both Slow Pinch Mode (SFM) and Fast Pinch Mode (FFM); the latter using a speed factor (SF) of 90 kA cm-1 Torr-0.5 for FFM in deuterium [S Lee et al, IEEE Trans Plasma Science 24, 1101-1105 (1996)]; and the former with SF of less than half that value for SFM. Starting with available 6 × 450 µF capacitors rated at 11kV (10% reversal), numerical experiments indicate safe operation at 9 kV, 6 Torr deuterium with FFM anode of 5 cm radius; producing intense ion beam and streaming plasma pulses which would be useful for studies of potential fusion reactor wall materials. On the other hand operating at 5 kV, 10 Torr deuterium with SFM anode of 10 cm radius leads to long-duration, uniform large-area flow which could be more suitable for synthesis of nano-materials. The dual plasma focus design is illustrated here with two figures showing FFM and SFM electrodes.

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