Physical and photovoltaic characteristics of copper oxide thin films as hole-selective layers for screen-printed mono-crystalline silicon solar cell applications

Vacuum ◽  
2022 ◽  
Vol 197 ◽  
pp. 110805
Author(s):  
Chin-Lung Cheng ◽  
Chi-Chung Liu ◽  
Ming-Zhi Dai
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Copper Oxide ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Oxide Thin Films ◽  
Photovoltaic Characteristics ◽  
Screen Printed

scholarly journals Selective emitter using a screen printed etch barrier in crystalline silicon solar cell

2012 ◽  
Vol 7 (1) ◽  
pp. 410 ◽  
Author(s):  
Kyuwan Song ◽  
Bonggi Kim ◽  
Hoongjoo Lee ◽  
Youn-Jung Lee ◽  
Cheolmin Park ◽  
...  
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Selective Emitter ◽  
Screen Printed

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

Sub-5 µm Thin Film Crystalline Silicon Solar Cell on Alumina Ceramic Substrate

1993 ◽  
Vol 32 (Part 2, No. 6A) ◽  
pp. L770-L773 ◽  
Author(s):  
Kenichi Ishii ◽  
Hideshi Nishikawa ◽  
Tetsuo Takahashi ◽  
Yutaka Hayashi
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Alumina Ceramic ◽  
Ceramic Substrate ◽  
Crystalline Silicon Solar Cell
Sign in / Sign up

Export Citation Format

Share Document