scholarly journals Influence of substrate temperature and bias voltage on the optical transmittance of TiN films

Vacuum ◽  
2003 ◽  
Vol 70 (1) ◽  
pp. 21-28 ◽  
Author(s):  
H.Zafer Durusoy ◽  
Özlem Duyar ◽  
Atilla Aydınlı ◽  
Feridun Ay
Keyword(s):  
Substrate Temperature ◽  
Bias Voltage ◽  
Optical Transmittance ◽  
Tin Films ◽  
Influence Of Substrate

Influence of Substrate Temperature and Bias Voltage on Structure and Mechanical Properties of CrN Coatings

2013 ◽  
Vol 591 ◽  
pp. 99-103 ◽  
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Huan Ke ◽  
Ting Zhi Liu ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Substrate Temperature ◽  
Deposition Rate ◽  
Bias Voltage ◽  
High Deposition Rate ◽  
Properties Of Coatings ◽  
Unbalanced Magnetron ◽  
Magnetron Sputter ◽  
Influence Of Substrate ◽  
Crn Coatings

CrN coatings have been deposited successfully by Closed Filed Unbalanced Magnetron Sputter Ion Plating (CFUMSIP). The effect of substrate temperature (TS) and bias voltage (VB) together on microstructure, morphologies and mechanical properties of CrN coatings were studied. The results showed that the deposition rate of CrN coatings declines with the increase of VB Under both room temperature (R.M.) and 300°C. The FCC-CrN disappeared gradually and orth-CrN arised with the increase of VB, and the TS promoted the transformation from FCC - CrN to orth - CrN. The surface morphology of CrN coatings with changed VBs was greatly different, and VB could further improve the mechanical properties of coatings. In this paper, the CrN coating with the parameters (TS =300°C, VB =-30V) had relatively high deposition rate and mechanical properties.

EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OF Ti AND TiN FILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE

2012 ◽  
Vol 19 (04) ◽  
pp. 1250037
Author(s):  
NISHAT ARSHI ◽  
JUNQING LU ◽  
BON HEUN KOO ◽  
CHAN GYU LEE ◽  
FAHEEM AHMED
Keyword(s):  
Substrate Temperature ◽  
Grain Structure ◽  
Morphological Properties ◽  
X Ray Diffraction ◽  
Tin Films ◽  
Evaporation Technique ◽  
Columnar Grain ◽  
Influence Of Substrate ◽  
Xrd Patterns ◽  
Deposited Films

We report the deposition of Ti and TiN films on Si/SiO2 (100) substrate using e-beam evaporation technique. The influence of substrate temperature on the structural and morphological properties has been studied. The structure and morphology of the deposited films were analyzed by X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) measurements, respectively. XRD patterns reveal the FCC symmetry for both the Ti and TiN films. The grain size of the films was found to increase with the increase in substrate temperature. FESEM micrographs showed a smooth morphology of the film with columnar grain structure.

scholarly journals Photo- and Electrochromic Properties of Activated Reactive EvaporatedMoO3Thin Films Grown on Flexible Substrates

2008 ◽  
Vol 2008 ◽  
pp. 1-5 ◽  
Author(s):  
K. Hari Krishna ◽  
O. M. Hussain ◽  
C. Guillen
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Molybdenum Trioxide ◽  
Irradiation Time ◽  
Visible Region ◽  
Optical Transmittance ◽  
Photochromic Properties ◽  
Evaporation Technique ◽  
Influence Of Substrate ◽  
Activated Reactive Evaporation

The molybdenum trioxide (MoO3) thin films were grown onto ITO-coated flexible Kapton substrates using plasma assisted activated reactive evaporation technique. The film depositions were carried out at constant glow power and oxygen partial pressures of 8 W and1×10−3Torr, respectively. The influence of substrate temperature on the microstructural and optical properties was investigated. TheMoO3thin films prepared at a substrate temperature of 523 K were found to be composed of uniformly distributed nanosized grains with an orthorhombic structure ofα-MoO3. These nanocrystallineMoO3thin films exhibited higher optical transmittance of about 80% in the visible region with an evaluated optical band gap of 3.29 eV. With the insertion of 12.5 mC/cm2, the films exhibited an optical modulation of 40% in the visible region with coloration efficiency of 22 cm2/C at the wavelength of 550 nm. TheMoO3films deposited at 523 K demonstrated better photochromic properties and showed highest color center concentration for the irradiation time of 30 minutes at 100 mW/cm2.

Influence of Substrate Temperature on the Structure of Tin-Films

1986 ◽  
Vol 68 ◽  
Author(s):  
J. M. Molarius ◽  
A. S. Korhonen ◽  
E. Erola ◽  
E. Nykanen
Keyword(s):  
Substrate Temperature ◽  
Preferred Orientation ◽  
Tin Films ◽  
X Ray ◽  
Ion Plating ◽  
Nitrogen Concentrations ◽  
Influence Of Substrate ◽  
Nitrogen Contents ◽  
Dense Films

AbstractThree series of Ti-N films with varying nitrogen contents from about 8 to 52 at.% N were deposited by triode ion plating at temperatures of 773, 623 and 373 K, respectively.Marked changes in the structures of the films with decreasing temperature were observed by x-ray diffraction.Stoichiometric δ-TiN which showed (220) preferred orientation at 773 K changed to (111) at lower temperatures.At intermediate nitrogen concentrations α-Ti (002) decreased and a new ε-Ti2N (002) developed with decreasing temperature.Very smooth and dense films could be produced at the lower temperatures.

Influence of substrate temperature on nitridation of (001) GaAs using RF-radical source

2009 ◽  
Vol 311 (10) ◽  
pp. 2992-2995 ◽  
Author(s):  
Shigeya Naritsuka ◽  
Midori Mori ◽  
Yoshitaka Takeuchi ◽  
Takahiro Maruyama
Keyword(s):  
Substrate Temperature ◽  
Influence Of Substrate

Influence of Substrate Temperature in the Morphology and Microstructure of YSZ Films Obtained on LSM Porous Substrate via Spray Pyrolysis

2012 ◽  
Vol 727-728 ◽  
pp. 691-696 ◽  
Author(s):  
Tiago Falcade ◽  
Giselle Barbosa de Oliveira ◽  
Diego Pereira Tarragó ◽  
Vânia Caldas de Sousa ◽  
Célia de Fraga Malfatti
Keyword(s):  
Substrate Temperature ◽  
Spray Pyrolysis ◽  
Spray Pyrolysis Technique ◽  
Precursor Solution ◽  
Cubic Phase ◽  
Porous Substrate ◽  
X Ray Diffraction ◽  
Heat Treated ◽  
Ft Ir ◽  
Influence Of Substrate

Many studies have been reported in the literature related to YSZ films deposited on dense substrate or applied directly on the SOFC anode. However, there are not a lot of studies about the YSZ deposition on the cathode. The present work aims to obtain yttria-stabilized zirconia (YSZ), using the spray pyrolysis technique, for their application as electrolyte in solid oxide fuel cells (SOFC). The films were obtained from a precursor solution containing zirconium and yttrium salts, dissolved in ethanol and propylene glycol (1:1), this solution was sprayed onto a heated LSM porous substrate. The substrate temperature was varied in order to obtain dense and homogeneous films. After deposition, the films were heat treated, aiming to crystallize and stabilize the zirconia cubic phase. The films were characterized by Scanning Electron Microscopy (SEM), thermal analysis, X-ray diffraction and Fourier transform Infrared Spectroscopy (FT-IR).

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