Preparation and characterization of CdO films deposited by dc magnetron reactive sputtering

1998 ◽  
Vol 35 (3-4) ◽  
pp. 214-220 ◽  
Author(s):  
T.K Subramanyam ◽  
S Uthanna ◽  
B Srinivasulu Naidu
Keyword(s):  
Reactive Sputtering ◽  
Dc Magnetron Reactive Sputtering ◽  
Cdo Films

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

Structural, optical and electrical characterization of nanocrystalline CdO films for device applications

Optik ◽  
2016 ◽  
Vol 127 (10) ◽  
pp. 4254-4257 ◽  
Author(s):  
Vipin Kumar ◽  
D.K. Sharma ◽  
Kapil K. Sharma ◽  
Sonalika Agrawal ◽  
M.K. Bansal ◽  
...  
Keyword(s):  
Electrical Characterization ◽  
Device Applications ◽  
Cdo Films

Raman scattering characterization of well-aligned IrO2 nanocrystals grown on sapphire substrates via reactive sputtering

2006 ◽  
Vol 37 (12) ◽  
pp. 1411-1415 ◽  
Author(s):  
Alexandru Korotcov ◽  
Hung-Pin Hsu ◽  
Ying-Sheng Huang ◽  
Dah-Shyang Tsai
Keyword(s):  
Raman Scattering ◽  
Reactive Sputtering ◽  
Sapphire Substrates

Preparation and Characterization of Pb(ZrxTi1-x)O3Thin Films by Reactive Sputtering Using an Alloy Target

1993 ◽  
Vol 32 (Part 1, No. 9B) ◽  
pp. 4122-4125 ◽  
Author(s):  
Koji Hayashi ◽  
Masaru Shimizu ◽  
Tadashi Shiosaki
Keyword(s):  
Reactive Sputtering ◽  
Alloy Target

Characterization of transparent conducting CdO films deposited by spray pyrolysis

1994 ◽  
Vol 9 (10) ◽  
pp. 1827-1832 ◽  
Author(s):  
K Gurumurugan ◽  
D Mangalaraj ◽  
S K Narayandass ◽  
K Sekar ◽  
C P Girija Vallabhan
Keyword(s):  
Spray Pyrolysis ◽  
Transparent Conducting ◽  
Cdo Films

Structural and morphological characterization of Nb2O5 thin films deposited by reactive sputtering

1994 ◽  
Vol 12 (1) ◽  
pp. 135-139 ◽  
Author(s):  
D. Rosenfeld ◽  
R. Sanjinés ◽  
F. Lévy ◽  
P. A. Buffat ◽  
V. Demarne ◽  
...  
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Morphological Characterization
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