Quantitative compositional depth profiling of Si1−x−yGexCy thin films by simultaneous elastic recoil detection and Rutherford backscattering spectrometry

Author(s):  
S.C. Gujrathi ◽  
S. Roorda ◽  
J.G. D'Arcy ◽  
Randall J. Pflueger ◽  
P. Desjardins ◽  
...  
1983 ◽  
Vol 218 (1-3) ◽  
pp. 601-606 ◽  
Author(s):  
Huan-sheng Cheng ◽  
Zhu-Ying Zhou ◽  
Fu-Chia Yang ◽  
Zhi-Wei Xu ◽  
Yue-Hua Ren

2000 ◽  
Vol 616 ◽  
Author(s):  
D.P. Adams ◽  
J.A. Romero ◽  
M.A. Rodriguez ◽  
J.A. Floro ◽  
J.C. Banks

AbstractErbium hydride thin films are grown onto polished, a-axis α Al2O3 (sapphire) substrates by reactive ion beam sputtering and analyzed to determine composition, phase and microstructure. Erbium is sputtered while maintaining a H2 partial pressure of 1.4 ×10−4 Torr. Growth is conducted at several substrate temperatures between 30 and 500°C. Rutherford backscattering spectrometry (RBS) and elastic recoil detection analyses after deposition show that the H/Er areal density ratio is approximately 3:1 for growth temperatures of 30, 150 and 275°C, while for growth above ∼430 °C, the ratio of hydrogen to metal is closer to 2:1. However, x-ray diffraction shows that all films have a cubic metal sublattice structure corresponding to that of ErH2. RBS and Auger electron spectroscopy confirm that sputtered erbium hydride thin films are relatively free of impurities.


2016 ◽  
Vol 26 (1) ◽  
pp. 83 ◽  
Author(s):  
Vu Duc Phu ◽  
Le Hong Khiem ◽  
A. P. Kobzev ◽  
M. Kulik

This paper presents the results of an experimental study of three samples containing various elements in the near-surface layers. The depth profiles of all the elements of different atomic masses from hydrogen to silver were investigated by Rutherford Backscattering Spectrometry (RBS) and Elastic Recoil Detection Analysis (ERDA). The experiments were performed by using the low-energy (about 2 MeV) 4He+ ion beams. The obtained results demonstrate the possibility of the RBS and ERDA methods in the investigation of depth profiles of any mass element with an atomic concentration of about 0.01 at.% and a depth resolution close to 10 nm.


1992 ◽  
Vol 282 ◽  
Author(s):  
David C. Smith ◽  
Rodrigo R. Rubiano ◽  
Matthew D. Healy ◽  
Robert W. Springer

ABSTRACTStable zirconium carbide thin films have been deposited from a singlesource organometallic precursor, tetraneopentyl zirconium, at substrate temperatures above 500 °C. Materials deposited above this temperature are crystalline by X-ray diffraction. A metal to carbon ratioof 1:2 is observed by Auger electron spectroscopy depth profiling. X-ray photoelectron spectroscopy indicates the zirconium is single phase. The observed spectra correspond well to spectra for zirconium carbide standards. Carbon XPS reveals carbidic and graphitic or hydrocarbon species with a third unknown carbon species. Elastic recoil detection finds a large, up to 16%, hydrogen content in the thin film.


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