Electron Radiation Damage on thin Films of Phenylalanine
1973 ◽
Vol 31
◽
pp. 484-485
Keyword(s):
The Mean
◽
Consecutive observation of the mass loss and change in electron energy loss spectra are being carried on In a simple field emission scanning mlcroscope. The specimens are prepared by slow sublimation onto thin carbon films on a copper grid.For mass loss measurement, unscattered electrons Nun are counted, W'lich Is related to Incident beam Intensity N0 by Nun = N0 exp(-(ai+ae)t), where tIs a specimen thickness, ae, ai the Inverse of the mean free path for elastic and Inelastic scattering, respectively. With 20 KeV and 12 mrad aperture angle, most of the elastically scattered electrons are stopped by the aperture. The Inelastically scattered electrons arefll tered by the spectrometer.
1983 ◽
Vol 41
◽
pp. 388-389
1990 ◽
Vol 48
(2)
◽
pp. 64-65
1985 ◽
Vol 43
◽
pp. 398-399
1985 ◽
Vol 43
◽
pp. 396-397
1990 ◽
Vol 48
(1)
◽
pp. 514-515
◽
1981 ◽
Vol 39
◽
pp. 190-191