Design of a high-performance auger spectrometer in the STEM

1988 ◽  
Vol 46 ◽  
pp. 668-669
Author(s):  
Feng Ouyang
Keyword(s):  
High Performance ◽  
Collection Efficiency ◽  
Focal Length ◽  
Spot Size ◽  
Objective Lens ◽  
Energy Analyzer ◽  
Auger Analysis ◽  
Resolution Electron ◽  
Free Region ◽  
Field Free Region

In high resolution electron beam instruments, Auger analysis is usually performed by keeping the sample in a field free region and employing a standard energy analyzer such as hemispherical sector (HSA) or a cylindrical mirror (CMA). In spite of its simplicity, this arrangement results in long focal length operation and consequently a relatively large spot size. In addition, the collection efficiencies of the energy analyzer coupled with such STEM/SEM/SAM systems tend to be small. If however we perform Auger analysis with the sample immersed in the objective lens field, not only would we have the capability of producing a subnanometer diameter probe, but we can also use the post- or pre-specimen field to parallelize the emitted electrons to yield higher collection efficiency.One approach is to use an electrostatic optics extraction system. In this paper magnetic optics extraction will be considered.

Development of an Ultra - High - Resolution Low Voltage(LV) SEM with an Optimized “in-lens” Design

1990 ◽  
Vol 48 (1) ◽  
pp. 388-389
Author(s):  
Takashi Nagatani ◽  
Mitsugu Sato ◽  
Masako OSUMI
Keyword(s):  
High Resolution ◽  
Low Voltage ◽  
Collection Efficiency ◽  
Spherical Aberration ◽  
Chromatic Aberration ◽  
Spot Size ◽  
Objective Lens ◽  
Tilting Angle ◽  
Working Distance ◽  
Better Than

An “in-lens” type FESEM, Hitachi S-900, developed as an ultra high resolution SEM having 0.7nm resolution at 30kV(Nagatani et al 1986), was modified for better performance at low beam energy(about 5kV or below) with small aberrations of ths objective lens and dual specimen position design. This is in responce to the recent upsurge of interest in using the LVSEM, which enables us hopefully to observe the surface topography of uncoated samples directly with maximum fidelity(Pawley 1987).The actual visibility of the minute topographical details depends upon not anly the spot size of the scanning beam but also physics of interaction between impinging electrons and solid sample(Joy 1989). However, the resolution can never be better than the spot size. Then, it would seem logical to specify the spot size first when designing a high resolution SEM. As discussed earlier(Crewe 1985; Nagatani et al 1987), the spot size of the beam is mainly limited by spherical aberration of the objective lens and diffraction at high voltage(about 10 kV and above). On the other hand, chromatic aberration and diffraction are the dominant factors at low voltages(about 5kV or below). Source size of a cold field emission is so small that we could neglect it for simplicity.In general, chromatic aberration can be smaller at higher excitation of a narrow gap objective pole-piece, which also made the working distance short. Therefore, some compromise is necessary among minimized aberrations, required specimen size, stage traverse and tilting angle etc. In practice, tolerable distortion of the image at low magnification and collection efficiency of the secondary electrons are another factors to be considered in designing the instrument. By taking these factors in simulation, an optimized objective lens was designed as shown in Table 1.

Simulation of Magnetic Induction Mapping in the TEM

1997 ◽  
Vol 3 (S2) ◽  
pp. 1157-1158
Author(s):  
J. Dooley ◽  
M. De Graef
Keyword(s):  
Objective Lens ◽  
Magnetic Storage ◽  
Experimental Conditions ◽  
Storage Devices ◽  
Lorentz Microscopy ◽  
Full Characterization ◽  
Thin Foils ◽  
Free Region ◽  
High Resolution Tem ◽  
Field Free Region

The design of modern magnetic storage devices with their rapidly increasing information density ne-cessitates a full characterization of the underlying microstructure of the device materials. Lorentz microscopy has for several decades been the main vehicle for micro-magnetic observations. The pri-mary limitation of the Lorentz modes is perhaps the attainable magnification. To avoid saturation, the sample must be placed in a low-field or preferably field-free region in the column, and this invariably means that the microscope can only be operated at low magnifications. Both Fresnel and Foucault images are rather sensitive to the exact experimental conditions which renders quantitative observa-tions quite difficult, if not impossible. Inelastic scattering further limits the usefulness of Lorentz observations to very thin foils.We have recently reported1 a novel Lorentz microscopy setup, combining a Gatan Imaging Filter (GIF) and a JEOL 4000EX top-entry high resolution TEM, operated at 400 kV with the main objective lens switched off.

An Application of Strongly Excited Objective Lens to Low Loss Image

1975 ◽  
Vol 33 ◽  
pp. 138-139
Author(s):  
Y. Kokubo ◽  
K. Ueno ◽  
M. Iwatsuki ◽  
H. Koike
Keyword(s):  
Thin Film ◽  
Electron Microscope ◽  
Objective Lens ◽  
Energy Analyzer ◽  
Low Loss ◽  
Surface Layers ◽  
Auger Analysis ◽  
X Ray ◽  
Diffraction Patterns ◽  
Quantitation Method

In recent years, analytical methods for surface layers such as IMMA, Auger analysis, and ESCA have been developed and put to practical use with considerable results. The analyzable microarea on the specimen surface, however, is limited to 1 mmø with ESCA, 3 with IMMA and 0.5 μø with Auger analysis---all these values are considerably large as compared with 100 to 200Å areas which are presently analyzable on thin film specimens, by use of the energy dispersive X-ray spectrometer or the electron energy analyzer on the conventional electron microscope. These three methods involve more---problems the inability to provide information on diffraction patterns and the difficulty in obtaining any established quantitation method.

Development of a Computer-Controlled 120kV High-Performance Tem

1996 ◽  
Vol 54 ◽  
pp. 446-447
Author(s):  
H. Kobayashi ◽  
I. Nagaoki ◽  
E. Nakazawa ◽  
T. Kamino
Keyword(s):  
High Resolution ◽  
High Performance ◽  
Spherical Aberration ◽  
Focal Length ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Wide Field ◽  
High Contrast ◽  
Computer Controlled ◽  
The Magnetic Field

A new computer controlled 120kV high performance TEM has been developed(Fig. 1). The image formation system of the microscope enables us to observe high resolution, wide field,and high contrast without replacing the objective lens pole-piece. The objective lens is designed for high- contrast (HC) and high-resolution(HR) modes, and consists of a double gap and two coils. A schematic drawing of the objective lens and the strength of the magnetic field of the lens is described in Fig.2. When the objective lens is used in HC mode, upper and lower coils are operated at a lens current of same polarity to form the long focal length. The focal length(fo), spherical aberration coefficient(Cs) and chromatic aberration coefficient (Cc) in HC mode at 100kV are 6.5, 3.4 and 3.1mm, respectively. Magnification range at HC mode is × 700 to × 200,000. The viewing area with an objective aperture of a diameter of 10μm is 160mm in diameter. In HR mode, the polarity of lower coil current is reversed to form a shorter focal length for high resolution image observation. The fo, Cs and Cc of the objective lens in HR mode at lOOkV are 3.1, 2.8 and 2.3mm, respectively. The highest magnification in HR mode is × 600,000.

Design of objective lens for 200-kV high-resolution electron microscopes

1983 ◽  
Vol 41 ◽  
pp. 314-315
Author(s):  
K. Tsuno ◽  
T. Honda ◽  
Y. Harada ◽  
M. Naruse
Keyword(s):  
Optical Properties ◽  
Computer Technology ◽  
Axial Magnetic Field ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Resolution Electron ◽  
Correction Of Astigmatism ◽  
Three Stages ◽  
Electron Microscopes ◽  
Stage 1

Developement of computer technology provides much improvements on electron microscopy, such as simulation of images, reconstruction of images and automatic controll of microscopes (auto-focussing and auto-correction of astigmatism) and design of electron microscope lenses by using a finite element method (FEM). In this investigation, procedures for simulating the optical properties of objective lenses of HREM and the characteristics of the new lens for HREM at 200 kV are described.The process for designing the objective lens is divided into three stages. Stage 1 is the process for estimating the optical properties of the lens. Firstly, calculation by FEM is made for simulating the axial magnetic field distributions Bzc of the lens. Secondly, electron ray trajectory is numerically calculated by using Bzc. And lastly, using Bzc and ray trajectory, spherical and chromatic aberration coefficients Cs and Cc are numerically calculated. Above calculations are repeated by changing the shape of lens until! to find an optimum aberration coefficients.

The Reduction of Chromatic Aberrations Due to Instrumental Instabilities

1971 ◽  
Vol 29 ◽  
pp. 14-15
Author(s):  
J. S. Lally ◽  
R. Evans
Keyword(s):  
Electron Microscope ◽  
High Voltage ◽  
Focal Length ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Usual Practice ◽  
Voltage Electron ◽  
Short Focal Length ◽  
Chromatic Aberrations ◽  
Electron Microscopes

One of the instrumental factors often limiting the resolution of the electron microscope is image defocussing due to changes in accelerating voltage or objective lens current. This factor is particularly important in high voltage electron microscopes both because of the higher voltages and lens currents required but also because of the inherently longer focal lengths, i.e. 6 mm in contrast to 1.5-2.2 mm for modern short focal length objectives.The usual practice in commercial electron microscopes is to design separately stabilized accelerating voltage and lens supplies. In this case chromatic aberration in the image is caused by the random and independent fluctuations of both the high voltage and objective lens current.

A Superconducting Microscope

1971 ◽  
Vol 29 ◽  
pp. 10-11 ◽  
Author(s):  
R. E. Worsham ◽  
J. E. Mann ◽  
E. G. Richardson
Keyword(s):  
Liquid Helium ◽  
Focal Length ◽  
Vacuum System ◽  
Objective Lens ◽  
Electrical Instability ◽  
Radiation Shields ◽  
And Control ◽  
Thermal Oscillations ◽  
Flux Pump

This superconducting microscope, Figure 1, was first operated in May, 1970. The column, which started life as a Siemens Elmiskop I, was modified by removing the objective and intermediate lenses, the specimen chamber, and the complete vacuum system. The large cryostat contains the objective lens and stage. They are attached to the bottom of the 7-liter helium vessel and are surrounded by two vapor-cooled radiation shields.In the initial operational period 5-mm and 2-mm focal length objective lens pole pieces were used giving magnification up to 45000X. Without a stigmator and precision ground pole pieces, a resolution of about 50-100Å was achieved. The boil-off rate of the liquid helium was reduced to 0.2-0.3ℓ/hour after elimination of thermal oscillations in the cryostat. The calculated boil-off was 0.2ℓ/hour. No effect caused by mechanical or electrical instability was found. Both 4.2°K and 1.7-1.9°K operation were routine. Flux pump excitation and control of the lens were quite smooth, simple, and, apparently highly stable. Alignment of the objective lens proved quite awkward, however, with the long-thin epoxy glass posts used for supporting the lens.

Improvements in the electron probe forming capabilities and x-ray hole counts in the Philips TEM

1983 ◽  
Vol 41 ◽  
pp. 376-377
Author(s):  
Richard L. McConville
Keyword(s):  
Field Strength ◽  
Electron Probe ◽  
Spherical Aberration ◽  
Focal Length ◽  
Objective Lens ◽  
Parallel Beam ◽  
Tilt Axis ◽  
X Ray ◽  
Small Probe ◽  
Specimen Height

A second generation twin lens has been developed. This symmetrical lens with a wider bore, yet superior values of chromatic and spherical aberration for a given focal length, retains both eucentric ± 60° tilt movement and 20°x ray detector take-off angle at 90° to the tilt axis. Adjust able tilt axis height, as well as specimen height, now ensures almost invariant objective lens strengths for both TEM (parallel beam conditions) and STEM or nano probe (focused small probe) modes.These modes are selected through use of an auxiliary lens situ ated above the objective. When this lens is on the specimen is illuminated with a parallel beam of electrons, and when it is off the specimen is illuminated with a focused probe of dimensions governed by the excitation of the condenser 1 lens. Thus TEM/STEM operation is controlled by a lens which is independent of the objective lens field strength.

Comparison of Deterministic and Linear Cosine Spatial Filtering of Transmission Electron Micrographs

1972 ◽  
Vol 30 ◽  
pp. 596-597
Author(s):  
David A. Ansley
Keyword(s):  
Spherical Aberration ◽  
Focal Length ◽  
Chromatic Aberration ◽  
Spatial Filter ◽  
Operating Conditions ◽  
Objective Lens ◽  
List Type ◽  
Spatial Filters ◽  
Transmission Electron ◽  
Wide Range

The coherence of the electron flux of a transmission electron microscope (TEM) limits the direct application of deconvolution techniques which have been used successfully on unmanned spacecraft programs. The theory assumes noncoherent illumination. Deconvolution of a TEM micrograph will, therefore, in general produce spurious detail rather than improved resolution.A primary goal of our research is to study the performance of several types of linear spatial filters as a function of specimen contrast, phase, and coherence. We have, therefore, developed a one-dimensional analysis and plotting program to simulate a wide 'range of operating conditions of the TEM, including adjustment of the:(1) Specimen amplitude, phase, and separation(2) Illumination wavelength, half-angle, and tilt(3) Objective lens focal length and aperture width(4) Spherical aberration, defocus, and chromatic aberration focus shift(5) Detector gamma, additive, and multiplicative noise constants(6) Type of spatial filter: linear cosine, linear sine, or deterministic

A High Resolution Scanning Microscope

1968 ◽  
Vol 26 ◽  
pp. 356-357
Author(s):  
A. V. Crewe ◽  
J. Wall ◽  
L. M. Welter
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Spherical Aberration ◽  
Focal Length ◽  
Spot Size ◽  
Emission Source ◽  
Field Of View ◽  
Scanning Microscope ◽  
Magnetic Lens ◽  
High Quality

A scanning microscope using a field emission source has been described elsewhere. This microscope has now been improved by replacing the single magnetic lens with a high quality lens of the type described by Ruska. This lens has a focal length of 1 mm and a spherical aberration coefficient of 0.5 mm. The final spot size, and therefore the microscope resolution, is limited by the aberration of this lens to about 6 Å.The lens has been constructed very carefully, maintaining a tolerance of + 1 μ on all critical surfaces. The gun is prealigned on the lens to form a compact unit. The only mechanical adjustments are those which control the specimen and the tip positions. The microscope can be used in two modes. With the lens off and the gun focused on the specimen, the resolution is 250 Å over an undistorted field of view of 2 mm. With the lens on,the resolution is 20 Å or better over a field of view of 40 microns. The magnification can be accurately varied by attenuating the raster current.

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