Comprehensive multilayer film analysis with XPS, AES, and EDS
Wavelength and energy dispersive x-ray spectroscopy (WDS and EDS) are routinely utilized to measure qualitatively and quantitatively the composition of microscopic features/phases of thickness 0.5 (μm or greater in solids. Surface spectroscopies, especially x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES), are employed to determine surface chemistry and surface composition respectively of microscopic features 0.2-5 nm thick. The combined utilization of AES and EDS (or WDS) permits microanalysis of surface and subsurface features/phases. Two areas of improved analysis through combined utilization of AES and EDS are imaging/elemental mapping and measurement of vertical diffusion profiles. Strengths of XPS in complementing EDS/WDS will also be discussed.High resolution surface elemental or chemical mapping can be carried out with scanning Auger or secondary ion mass spectrometry (SIMS) microanalysis, respectively. In fact, both offer improved spacial resolution over WDS and EDS elemental x-ray dot mapping. Using sample rotation while removing material by ion beam sputter etching, three dimensional mapping can be carried out by either surface analysis technique, permitting microanalysis of buried features even in complex heterostructures.