Reflection electron microscopy of triangular quantum wells
Asymmetric triangular quantum wells (ATQW) have recently been developed to improve the absorption and emission characteristics of opto-electronic devices. A triangular compositional gradient is produced during epitaxial growth of AlxGa1-xAs on GaAs by either continuous variation of x or by alternate deposition of thin layers of the two compounds where the ratio of the layer thickness produces an average alloy composition. The knowledge of the compositional profile of the actual ATQW, as derived from HREM, has proven essential for the description of the photo-emission properties of the device. Recently, the technique of reflection electron microscopy has also been applied to multiple rectangular quantum wells of GaAs/AlxGa1-xAs with the encouraging result that layers with 1% Al can be distinguished from the GaAs layers. In this work we investigate the applicability of REM to characterization of ATQW.Triangular quantum wells were grown by MBE, employing the digital alloy method. Fig. 1 shows a schematic representation of the nominal thickness and composition of the studied ATQW.