Mass Thickness Analysis of Gold Thin Films Using Room Temperature Gas-Phase Chlorination

2009 ◽  
Vol 81 (8) ◽  
pp. 2877-2883 ◽  
Author(s):  
Alexander Vaskevich ◽  
Tali Sehayek ◽  
Israel Rubinstein
Keyword(s):  
Thin Films ◽  
Gas Phase ◽  
Room Temperature ◽  
Mass Thickness ◽  
Gold Thin Films

ELECTRICAL RESISTIVITY OF NANOSTRUCTURED PLATINUM AND GOLD THIN FILMS

2004 ◽  
Vol 11 (02) ◽  
pp. 223-227 ◽  
Author(s):  
M. C. SALVADORI ◽  
A. R. VAZ ◽  
R. J. C. FARIAS ◽  
M. CATTANI
Keyword(s):  
Experimental Data ◽  
Thin Films ◽  
Surface Roughness ◽  
Electrical Resistivity ◽  
Room Temperature ◽  
Theoretical Estimate ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Correlation Lengths ◽  
Gold Thin Films

We have measured, at room temperature, the resistivity, the surface roughness and the lateral surface correlation lengths of nanostructured platinum and gold thin films. The films' thickness d, deposited by vacuum arc plasma, is in the range 1.31≤d≤11.66 nm for platinum and 1.77≤d≤10.46 nm for gold. A theoretical estimate of our experimental data has been made.

scholarly journals Nano-additively manufactured gold thin films with high adhesion and near-bulk electrical resistivity via jet-assisted, nanoparticle-dominated, room-temperature microsputtering

2020 ◽  
Vol 36 ◽  
pp. 101679
Author(s):  
Yosef Kornbluth ◽  
Richard Mathews ◽  
Lalitha Parameswaran ◽  
Livia M. Racz ◽  
Luis F. Velásquez-García
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Room Temperature ◽  
High Adhesion ◽  
Gold Thin Films

scholarly journals Enhanced uptake of water by oxidatively processed oleic acid

2004 ◽  
Vol 4 (8) ◽  
pp. 2083-2089 ◽  
Author(s):  
A. Asad ◽  
B. T. Mmereki ◽  
D. J. Donaldson
Keyword(s):  
Thin Films ◽  
Oleic Acid ◽  
Relative Humidity ◽  
Gas Phase ◽  
Room Temperature ◽  
Quartz Crystal ◽  
Plateau Region ◽  
Polymeric Product ◽  
Partial Pressures ◽  
Additional Water

Abstract. A quartz crystal microbalance apparatus has been used to measure the room temperature uptake of water vapour by thin films of oleic acid as a function of relative humidity, both before and following exposure of the films to various partial pressures of gas phase ozone. A rapid increase in the water-sorbing ability of the film is observed as its exposure to ozone is increased, followed by a plateau region in which additional water is taken up more gradually. In this fully-processed region the mass of water taken up by the film is about 4 times that of the unprocessed film. Infrared spectra of the films, measured after variable exposures to ozone, show dramatic increases in both the "free" and hydrogen-bonded O-H stretching regions, and a decrease in the intensity of olefinic features. These results are consistent with the formation of an oxygenated polymeric product or products, as well as the gas phase products previously identified.

scholarly journals Enhanced uptake of water by oxidatively processed oleic acid

2004 ◽  
Vol 4 (4) ◽  
pp. 4019-4038 ◽  
Author(s):  
A. Asad ◽  
B. T. Mmereki ◽  
D. J. Donaldson
Keyword(s):  
Thin Films ◽  
Oleic Acid ◽  
Relative Humidity ◽  
Gas Phase ◽  
Room Temperature ◽  
Quartz Crystal ◽  
Plateau Region ◽  
Polymeric Product ◽  
Partial Pressures ◽  
Additional Water

Abstract. A quartz crystal microbalance apparatus has been used to measure the room temperature uptake of water vapour by thin films of oleic acid as a function of relative humidity, both before and following exposure of the films to various partial pressures of gas phase ozone. A rapid increase in the water-sorbing ability of the film is observed as its exposure to ozone is increased, followed by a plateau region in which no additional water is taken up. In this fully-processed region the mass of water taken up by the film is about 4 times that of the unprocessed film. Infrared spectra of the films, measured after variable exposures to ozone, show dramatic increases in both the "free" and hydrogen-bonded O-H stretching regions, and a decrease in the intensity of olefinic features. These results are consistent with the formation of an oxygenated polymeric product or products, as well as the gas phase products previously identified.

Resistivity and Hall voltage in gold thin films deposited on mica at room temperature

2015 ◽  
Vol 332 ◽  
pp. 694-698 ◽  
Author(s):  
Sebastián Bahamondes ◽  
Sebastián Donoso ◽  
Antonio Ibañez-Landeta ◽  
Marcos Flores ◽  
Ricardo Henriquez
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Hall Voltage ◽  
Gold Thin Films

Studies on Water in the Hydration Chamber of a Modified Electron Microscope

1970 ◽  
Vol 28 ◽  
pp. 544-545
Author(s):  
R. C. Moretz ◽  
G. G. Hausner ◽  
D. F. Parsons
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electron Microscope ◽  
Steady State ◽  
Room Temperature ◽  
Small Mass ◽  
Equilibrium Pressure ◽  
Biological Objects ◽  
Mechanical Pump ◽  
Differential Pumping

Use of the electron microscope to examine wet objects is possible due to the small mass thickness of the equilibrium pressure of water vapor at room temperature. Previous attempts to examine hydrated biological objects and water itself used a chamber consisting of two small apertures sealed by two thin films. Extensive work in our laboratory showed that such films have an 80% failure rate when wet. Using the principle of differential pumping of the microscope column, we can use open apertures in place of thin film windows.Fig. 1 shows the modified Siemens la specimen chamber with the connections to the water supply and the auxiliary pumping station. A mechanical pump is connected to the vapor supply via a 100μ aperture to maintain steady-state conditions.

Interactions Between Al and Cr Thin Films

1976 ◽  
Vol 34 ◽  
pp. 638-639
Author(s):  
R. M. Anderson ◽  
T. M. Reith ◽  
M. J. Sullivan ◽  
E. K. Brandis
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Vacuum System ◽  
Processing Temperature ◽  
Diffusion Couples ◽  
Electronic Circuits ◽  
Intermetallic Formation ◽  
Si Substrates ◽  
Aluminum Silicon

Thin films of aluminum or aluminum-silicon can be used in conjunction with thin films of chromium in integrated electronic circuits. For some applications, these films exhibit undesirable reactions; in particular, intermetallic formation below 500 C must be inhibited or prevented. The Al films, being the principal current carriers in interconnective metal applications, are usually much thicker than the Cr; so one might expect Al-rich intermetallics to form when the processing temperature goes out of control. Unfortunately, the JCPDS and the literature do not contain enough data on the Al-rich phases CrAl7 and Cr2Al11, and the determination of these data was a secondary aim of this work.To define a matrix of Cr-Al diffusion couples, Cr-Al films were deposited with two sets of variables: Al or Al-Si, and broken vacuum or single pumpdown. All films were deposited on 2-1/4-inch thermally oxidized Si substrates. A 500-Å layer of Cr was deposited at 120 Å/min on substrates at room temperature, in a vacuum system that had been pumped to 2 x 10-6 Torr. Then, with or without vacuum break, a 1000-Å layer of Al or Al-Si was deposited at 35 Å/s, with the substrates still at room temperature.

Investigation of ultra-thin films of YBa2Cu3O7−δ grown on MgO

1990 ◽  
Vol 48 (4) ◽  
pp. 6-7
Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Deposition Process ◽  
Nucleation And Growth ◽  
Multilayer Structures ◽  
Rf Power ◽  
Oxygen Loss ◽  
Transmission Electron ◽  
Single Target ◽  
Mtorr Argon

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.

TEM sample preparation of wear-tested room-temperature pulsed-laser-deposited thin films of MoS2 by ultramicrotomy

1993 ◽  
Vol 51 ◽  
pp. 1118-1119
Author(s):  
Pamela F. Lloyd ◽  
Scott D. Walck
Keyword(s):  
Thin Films ◽  
Sample Preparation ◽  
Room Temperature ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Ultra High Vacuum ◽  
Wear Testing ◽  
Preparation Technique ◽  
Cross Sectional ◽  
Aerospace Applications

Pulsed laser deposition (PLD) is a novel technique for the deposition of tribological thin films. MoS2 is the archetypical solid lubricant material for aerospace applications. It provides a low coefficient of friction from cryogenic temperatures to about 350°C and can be used in ultra high vacuum environments. The TEM is ideally suited for studying the microstructural and tribo-chemical changes that occur during wear. The normal cross sectional TEM sample preparation method does not work well because the material’s lubricity causes the sandwich to separate. Walck et al. deposited MoS2 through a mesh mask which gave suitable results for as-deposited films, but the discontinuous nature of the film is unsuitable for wear-testing. To investigate wear-tested, room temperature (RT) PLD MoS2 films, the sample preparation technique of Heuer and Howitt was adapted.Two 300 run thick films were deposited on single crystal NaCl substrates. One was wear-tested on a ball-on-disk tribometer using a 30 gm load at 150 rpm for one minute, and subsequently coated with a heavy layer of evaporated gold.

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