The Origin of Lower Hole Carrier Concentration in Methylammonium Tin Halide Films Grown by a Vapor-Assisted Solution Process

2016 ◽  
Vol 2 (1) ◽  
pp. 22-28 ◽  
Author(s):  
Takamichi Yokoyama ◽  
Tze-Bin Song ◽  
Duyen H. Cao ◽  
Constantinos C. Stoumpos ◽  
Shinji Aramaki ◽  
...  
2015 ◽  
Vol 2015 ◽  
pp. 1-7 ◽  
Author(s):  
Fu-Shan Chen ◽  
Jen-Cheng Sung ◽  
Che-Yuan Yang ◽  
Chung-Hsin Lu

The codoping effects of sodium and bismuth ions on the characteristics of Cu(In,Ga)Se2films prepared via the solution process were investigated in this study. When sodium and bismuth ions were incorporated into Cu(In,Ga)Se2, the ratio of the intensity of (112) diffraction peak to that of (220/204) diffraction peak was greatly increased. The codoping process not only enlarged the sizes of the grains in the films but also resulted in densification of the films. The carrier concentration of Cu(In,Ga)Se2was found to be effectively increased to cause a reduction in the resistivity of the films. The above phenomena were attributed to the densified microstructures of the films and a decrease in the amount of the donor-type defects. The leakage current of the solar cells was found to be also decreased via the codoping process. Owing to the improved electrical properties of Cu(In,Ga)Se2films, the conversion efficiency of the fabricated solar cells was significantly enhanced.


2020 ◽  
Vol 10 (1) ◽  
Author(s):  
C. A. Hernández-Gutiérrez ◽  
Y. L. Casallas-Moreno ◽  
Victor-Tapio Rangel-Kuoppa ◽  
Dagoberto Cardona ◽  
Yaoqiao Hu ◽  
...  

Abstract We have studied the Mg doping of cubic GaN grown by plasma-assisted Molecular Beam Epitaxy (PA-MBE) over GaAs (001) substrates. In particular, we concentrated on conditions to obtain heavy p-type doping to achieve low resistance films which can be used in bipolar devices. We simulated the Mg-doped GaN transport properties by density functional theory (DFT) to compare with the experimental data. Mg-doped GaN cubic epitaxial layers grown under optimized conditions show a free hole carrier concentration with a maximum value of 6 × 1019 cm−3 and mobility of 3 cm2/Vs. Deep level transient spectroscopy shows the presence of a trap with an activation energy of 114 meV presumably associated with nitrogen vacancies, which could be the cause for the observed self-compensation behavior in heavily Mg-doped GaN involving Mg-VN complexes. Furthermore, valence band analysis by X-ray photoelectron spectroscopy and photoluminescence spectroscopy revealed an Mg ionization energy of about 100 meV, which agrees quite well with the value of 99.6 meV obtained by DFT. Our results show that the cubic phase is a suitable alternative to generate a high free hole carrier concentration for GaN.


2004 ◽  
Vol 848 ◽  
Author(s):  
Masahiro Shiraki ◽  
Jun-ichi Shimoyama ◽  
Shigeru Horii ◽  
Kohji Kishio

ABSTRACTIn the present study, hole carrier doping was attempted for CoSr2YCu2O7+δ which is a relating compound to a well known superconductor YBa2Cu3O7-δ by introduction of excess oxygen into CoO1+δ layer and cation substitutions. High valence metal substitution for cobalt and barium substitution for strontium were revealed to be able to introduce excess oxygen and generate hole carriers. Additional calcium substitution for yttrium enhanced hole carrier concentration p/Cu > 0.05 which was enough for superconductivity, however superconducting transition was not observed. This is possibly due to incorporation of cobalt in the CuO2 planes.


2010 ◽  
Vol 108 (2) ◽  
pp. 023516 ◽  
Author(s):  
T. Suski ◽  
G. Staszczak ◽  
S. Grzanka ◽  
R. Czernecki ◽  
E. Litwin-Staszewska ◽  
...  

2003 ◽  
Vol 763 ◽  
Author(s):  
H. W. Lee ◽  
Y. G. Wang ◽  
S. P. Lau ◽  
B. K. Tay

AbstractA detailed study of zinc oxide (ZnO) films prepared by filtered cathodic vacuum arc (FCVA) technique was carried out. To deposit the films, a pure zinc target was used and O2 was fed into the chamber. The electrical properties of both undoped and Al-doped ZnO films were studied. For preparing the Al-doped films, a Zn-Al alloy target with 5 wt % Al was used. The resistivity, Hall mobility and carrier concentration of the samples were measured. The lowest resistivity that can be achieved with undoped ZnO films was 3.4×10-3 Ωcm, and that for Al-doped films was 8×10-4 Ωcm. The carrier concentration was found to increase with Al doping.


Author(s):  
Koichiro Iida ◽  
Hideki Gorohmaru ◽  
Kazuhiro Nagayama ◽  
Koichi Ishibashi ◽  
Yoshiko Shoji ◽  
...  

2018 ◽  
Vol 31 (3) ◽  
pp. 20
Author(s):  
Sarmad M. M. Ali ◽  
Alia A.A. Shehab ◽  
Samir A. Maki

In this study, the ZnTe thin films were deposited on a glass substrate at a thickness of 400nm using vacuum evaporation technique (2×10-5mbar) at RT. Electrical conductivity and Hall effect measurements have been investigated as a function of variation of the doping ratios (3,5,7%) of the Cu element on the thin ZnTe films. The temperature range of (25-200°C) is to record the electrical conductivity values. The results of the films have two types of transport mechanisms of free carriers with two values of activation energy (Ea1, Ea2), expect 3% Cu. The activation energy (Ea1) increased from 29meV to 157meV before and after doping (Cu at 5%) respectively. The results of Hall effect measurements of ZnTe , ZnTe:Cu films show that all films were (p-type), the carrier concentration (1.1×1020 m-3) , Hall mobility (0.464m2/V.s) for pure ZnTe film, increases the carrier concentration (6.3×1021m-3) Hall mobility (2m2/V.s) for doping (Cu at 3%) film, but  decreases by increasing Cu concentration.


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