Theoretical Modeling of SiO2Photochemical Vapor Deposition and Comparison to Experimental Results for Three Oxidant Chemistries: SiH4+ O2, H2O/O2, and H2O2
2015 ◽
Vol 54
(9)
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pp. 2466-2475
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Keyword(s):
2015 ◽
Vol 67
◽
pp. 169-178
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1995 ◽
Vol 34
(Part 1, No. 6A)
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pp. 3216-3226
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2013 ◽
Vol 479-480
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pp. 96-99
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Keyword(s):