Molecular Orbital Studies of Zinc Oxide Chemical Vapor Deposition: Gas-Phase Hydrolysis of Diethyl Zinc, Elimination Reactions, and Formation of Dimers and Tetramers

Chemistry of Materials ◽

10.1021/cm020726p ◽

2003 ◽

Vol 15 (1) ◽

pp. 162-166 ◽

Author(s):

Stanley M. Smith ◽

H. Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Molecular Orbital ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diethyl Zinc ◽

Elimination Reactions ◽

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Molecular Orbital Studies of Zinc Oxide Chemical Vapor Deposition: Gas-Phase Radical Reactions

Chemistry of Materials ◽

10.1021/cm052314x ◽

2006 ◽

Vol 18 (7) ◽

pp. 1878-1884 ◽

Author(s):

Barbara H. Munk ◽

H. Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Molecular Orbital ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radical Reactions

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Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Gas Phase Complex Formation, Ligand Exchange, and Elimination Reactions

Chemistry of Materials ◽

10.1021/cm000107l ◽

2000 ◽

Vol 12 (8) ◽

pp. 2466-2474 ◽

Author(s):

Jason B. Cross ◽

H. Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Complex Formation ◽

Titanium Nitride ◽

Gas Phase ◽

Molecular Orbital ◽

Vapor Deposition ◽

Ligand Exchange ◽

Chemical Vapor ◽

Phase Complex ◽

Elimination Reactions

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Molecular orbital studies of the initial process of gallium oxide chemical vapor deposition: micro-hydrolysis of triethylgallium

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab2227 ◽

2019 ◽

Vol 58 (6) ◽

pp. 061010

Author(s):

Hiroshi Kawabata ◽

Hiroto Tachikawa

Keyword(s):

Chemical Vapor Deposition ◽

Molecular Orbital ◽

Vapor Deposition ◽

Gallium Oxide ◽

Chemical Vapor ◽

Hydrolysis Of ◽

Initial Process

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Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase β-elimination

Chemical Physics Letters ◽

10.1016/s0009-2614(01)00433-x ◽

2001 ◽

Vol 340 (3-4) ◽

pp. 343-347 ◽

Author(s):

Jason B. Cross ◽

H.Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Gas Phase ◽

Molecular Orbital ◽

Vapor Deposition ◽

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The Role of Oxygen Dissociation in Plasma Enhanced Chemical Vapor Deposition of Zinc Oxide from Oxygen and Diethyl Zinc

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-004-8841-6 ◽

2005 ◽

Vol 25 (2) ◽

pp. 169-192 ◽

Author(s):

Colin A. Wolden

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diethyl Zinc ◽

Oxygen Dissociation

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Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl gallium

Journal of Applied Physics ◽

10.1063/1.351977 ◽

1992 ◽

Vol 72 (11) ◽

pp. 5381-5392 ◽

Author(s):

Jianhua Hu ◽

Roy G. Gordon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Diethyl Zinc ◽

Pressure Chemical

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Semiconducting Zinc Oxide Films Prepared by Metal Organic Chemical Vapor Deposition from Diethyl Zinc

Journal of The Electrochemical Society ◽

10.1149/1.2127329 ◽

1981 ◽

Vol 128 (12) ◽

pp. 2684-2686 ◽

Author(s):

A. P. Roth ◽

D. F. Williams

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor ◽

Organic Chemical ◽

Diethyl Zinc ◽

Zinc Oxide Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Imido Dimer Formation and Elimination Reactions

Chemistry of Materials ◽

10.1021/cm000840c ◽

2001 ◽

Vol 13 (3) ◽

pp. 1095-1100 ◽

Author(s):

Jason B. Cross ◽

Stanley M. Smith ◽

H. Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Molecular Orbital ◽

Vapor Deposition ◽

Chemical Vapor ◽

Dimer Formation ◽

Elimination Reactions

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Growth Behavior, Nucleation Control and Excellent Optical Properties of Atomically Thin WS2 Thin Films Processed via Gas-phase Chemical Vapor Deposition

Applied Surface Science ◽

10.1016/j.apsusc.2021.150908 ◽

2021 ◽

pp. 150908

Author(s):

Nitin Babu Shinde ◽

Beo Deul Ryu ◽

Chang-Hee Hong ◽

Bellarmine Francis ◽

S. Chandramohan ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

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Effect of Si–H Bond on the Gas-Phase Chemistry of Trimethylsilane in the Hot Wire Chemical Vapor Deposition Process

The Journal of Physical Chemistry A ◽

10.1021/jp203966h ◽

2011 ◽

Vol 115 (37) ◽

pp. 10290-10298 ◽

Author(s):

Y. J. Shi ◽

X. M. Li ◽

R. Toukabri ◽

L. Tong

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hot Wire ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Vapor Deposition Process

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