Molecular Orbital Studies of Zinc Oxide Chemical Vapor Deposition:  Gas-Phase Radical Reactions

2006 ◽  
Vol 18 (7) ◽  
pp. 1878-1884 ◽  
Author(s):  
Barbara H. Munk ◽  
H. Bernhard Schlegel
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Molecular Orbital ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radical Reactions

Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase β-elimination

2001 ◽  
Vol 340 (3-4) ◽  
pp. 343-347 ◽  
Author(s):  
Jason B. Cross ◽  
H.Bernhard Schlegel
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Nitride ◽  
Gas Phase ◽  
Molecular Orbital ◽  
Vapor Deposition ◽  
Chemical Vapor

Growth Behavior, Nucleation Control and Excellent Optical Properties of Atomically Thin WS2 Thin Films Processed via Gas-phase Chemical Vapor Deposition

2021 ◽  
pp. 150908
Author(s):  
Nitin Babu Shinde ◽  
Beo Deul Ryu ◽  
Chang-Hee Hong ◽  
Bellarmine Francis ◽  
S. Chandramohan ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Growth Behavior ◽  
Phase Chemical

scholarly journals Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition

2017 ◽  
Vol 121 (47) ◽  
pp. 26465-26471 ◽  
Author(s):  
Mewlude Imam ◽  
Laurent Souqui ◽  
Jan Herritsch ◽  
Andreas Stegmüller ◽  
Carina Höglund ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thermal Chemical Vapor Deposition ◽  
Gas Phase Chemistry ◽  
Phase Chemistry

scholarly journals Gas-phase aluminium acetylacetonate decomposition: Revision of the current mechanism by VUV synchrotron radiation

2021 ◽  
Author(s):  
Sebastian Grimm ◽  
Seung-Jin Baik ◽  
Patrick Hemberger ◽  
Andras Bodi ◽  
Andreas Kempf ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Synchrotron Radiation ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Aluminium Oxide ◽  
Chemical Vapor ◽  
Phase Decomposition ◽  
Common Precursor ◽  
Current Mechanism

Although aluminium acetylacetonate, Al(C5H7O2)3, is a common precursor for chemical vapor deposition (CVD) of aluminium oxide, its gas phase decomposition is not very well investigated. Here, we studied its thermal...

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