Application of a Quantum Cascade Laser for Time-Resolved, in Situ Probing of CH4/H2and C2H2/H2Gas Mixtures during Microwave Plasma Enhanced Chemical Vapor Deposition of Diamond

2006 ◽  
Vol 110 (8) ◽  
pp. 2821-2828 ◽  
Author(s):  
A. Cheesman ◽  
J. A. Smith ◽  
M. N. R. Ashfold ◽  
N. Langford ◽  
S. Wright ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Cascade Laser ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Time Resolved ◽  
Quantum Cascade

In situ diagnosis of chemical species for the growth of carbon nanotubes in microwave plasma-enhanced chemical vapor deposition

2002 ◽  
Vol 11 (1) ◽  
pp. 59-66 ◽  
Author(s):  
Yun Sung Woo ◽  
Duk Young Jeon ◽  
In Taek Han ◽  
Nae Sung Lee ◽  
Jae Eun Jung ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Species ◽  
Chemical Vapor

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

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