Influence of Relative Humidity during Film Formation Processes on the Structure of Ultrathin Polymeric Films

Langmuir ◽  
1998 ◽  
Vol 14 (23) ◽  
pp. 6743-6748 ◽  
Author(s):  
U. Hecht ◽  
C. M. Schilz ◽  
M. Stratmann
Keyword(s):  
Relative Humidity ◽  
Film Formation ◽  
Polymeric Films ◽  
Formation Processes

Formation Mechanism of Epitaxial CoSi2 Films on (001) Si Using Ti-Co Bimetallic Layer Source Materials

1992 ◽  
Vol 280 ◽  
Author(s):  
S. L. Hsia ◽  
T. Y. Tana ◽  
P. L. Smith ◽  
G. E. Mcguire
Keyword(s):  
Film Formation ◽  
Substrate Surface ◽  
Native Oxide ◽  
Formation Processes ◽  
Mechanism Of Formation ◽  
Si Substrate ◽  
Barrier Material ◽  
Si Substrates ◽  
Bimetallic Layer ◽  
Source Materials

ABSTRACTThe mechanism of formation of epitaxial CoSi2 film on (001) Si substrate, produced using sequentially deposited Ti-Co bimetallic layer source materials for which Ti was deposited onto the Si substrates first, has been studied by observing the Co silicide formation processes and structures in samples prepared by isochronal annealing and by isothermal annealing. The results demonstrated that, in leading to epitaxial CoSi2 film formation, Ti has played two roles. It has served as a barrier material to Co atoms and thus preventing Co2Si from forming. More importantly, it has allowed nucleation and growth of epitaxial-CoSi2 to dominate the Co silicide film formation process, apparently because it has served as a cleanser to remove native oxide from the Si substrate surface.

Radiation-induced implantation of polymeric films in metallic substrates

1986 ◽  
Vol 1 (4) ◽  
pp. 577-582
Author(s):  
M.W. Ferralli ◽  
M. Luntz
Keyword(s):  
Film Formation ◽  
Ion Beam ◽  
Ion Beams ◽  
Polymeric Films ◽  
Beam Irradiation ◽  
Ion Beam Irradiation ◽  
Hydrocarbon Gases ◽  
Metallic Substrates ◽  
Radiation Induced ◽  
Stage Process

Implanted, polymeric films have been produced by accelerator-ion-beam irradiation of metallic substrates immersed in hydrocarbon gases. Typical substrates include silver, aluminum, and steel; hydrocarbon gases include 1,3 butadiene and ethylene at 6.6 Pa pressure; ion beams employed include singly ionized H, He, and Ar at 30 keV. Experimental procedures and corrosion-resistance properties of the films are reviewed (each discussed elsewhere). A theory of the film-formation process is presented. It is concluded that the films form as the result of a two-stage process: glow-discharge adhesion and polymerization followed by radiation-induced implantation resulting from collisional recoil and substrate sputtering.

Growth of Amorphous, Microcrystalline, and Epitaxial Silicon in Low Temperature Plasma Deposition

1990 ◽  
Vol 192 ◽  
Author(s):  
C. C. Tsai ◽  
G.B. Anderson ◽  
R. Anderson
Keyword(s):  
Plasma Deposition ◽  
Film Formation ◽  
Similar Process ◽  
Formation Processes ◽  
Low Temperature Plasma ◽  
Epitaxial Silicon ◽  
Temperature Plasma ◽  
Interface Quality ◽  
Network Propagation ◽  
Process Gases

ABSTRACTThis paper examines near-equilibrium and non-equilibrium film formation processes in the plasma deposition of Si and their effects on network propagation, defect generation and interface quality based on the concept of film formation as a balance between deposition and ‘etching.’ Using non-F reactant gases and conventional PECVD, epitaxial Si growth was achieved at 250°C. By adjusting the extent of ‘etching’, one can selectively obtain amorphous, microcrystalline, polycrystalline, and epitaxial Si using similar process gases and reactors.

scholarly journals Humidity-accelerated spreading of ionic liquids on a mica surface

RSC Advances ◽  
2017 ◽  
Vol 7 (68) ◽  
pp. 42718-42724 ◽  
Author(s):  
Zhantao Wang ◽  
Fuxi Shi ◽  
Cunlu Zhao
Keyword(s):  
Ionic Liquids ◽  
Water Vapor ◽  
Relative Humidity ◽  
Film Formation ◽  
Water Vapor Adsorption ◽  
Precursor Film ◽  
Mica Surface ◽  
Droplet Spreading ◽  
Wetting Behavior

The role of relative humidity (RH) on the wetting behavior of droplets of two [Rmim][NTf2] ionic liquids (ILs) on a mica surface was investigated and water vapor adsorption was found to enhance the ILs precursor film formation and droplet spreading.

Effects of Relative Humidity and Nanoparticle Incorporation on Nanostructures of PS-b-PEO Diblock Copolymer

2007 ◽  
Vol 1056 ◽  
Author(s):  
Juntao Wu ◽  
Minhua Zhao ◽  
Tinh Nguyen ◽  
Xiaohong Gu
Keyword(s):  
Relative Humidity ◽  
Spin Coating ◽  
Phase Contrast ◽  
Film Formation ◽  
Ordered Structure ◽  
Ordered Structures ◽  
Controlled Environments ◽  
Poly Ethylene Oxide ◽  
Poly Ethylene ◽  
Matrix Domains

ABSTRACTThe morphological structures of polystyrene-block-poly(ethylene oxide), PS-b-PEO, have been investigated under humidity controlled environments during film formation. Well-defined cylindrical microdomains oriented normal to the surface were induced by the high humidity during spin coating. Effects of the relative humidity (RH) on such ordered structures have also been studied. The results show that, the orientation and the ordering of the copolymer structures are very sensitive to the humidity of the environment during the film formation. Such ordered structure is stable at a variety of the RHs, and the phase contrast between the cylindrical PEO domains and the PS matrix domains can be significantly enhanced by the elevated RH. After the incorporation of the nanoparticles, however, the morphological structures of the PS-b-PEO are modified.

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