CMOS-Compatible Synthesis of Large-Area, High-Mobility Graphene by Chemical Vapor Deposition of Acetylene on Cobalt Thin Films

ACS Nano ◽  
2011 ◽  
Vol 5 (9) ◽  
pp. 7198-7204 ◽  
Author(s):  
Michael E. Ramón ◽  
Aparna Gupta ◽  
Chris Corbet ◽  
Domingo A. Ferrer ◽  
Hema C. P. Movva ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Mobility ◽  
Chemical Vapor ◽  
Large Area ◽  
Cobalt Thin Films ◽  
Cmos Compatible

Large-area synthesis of transition metal dichalcogenides via CVD and solution-based approaches and their device applications

Nanoscale ◽  
2021 ◽  
Author(s):  
Anh Tuan Hoang ◽  
Kairui Qu ◽  
Xiang Chen ◽  
Jong-Hyun Ahn
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Transition Metal Dichalcogenides ◽  
Chemical Vapor ◽  
Large Area ◽  
Wafer Scale ◽  
Metal Dichalcogenides ◽  
Device Applications

This article reviews the latest advances in the synthesis of wafer-scale thin films using chemical vapor deposition and solution-based methods and various device applications.

Scale-up of oCVD: large-area conductive polymer thin films for next-generation electronics

2015 ◽  
Vol 2 (2) ◽  
pp. 221-227 ◽  
Author(s):  
Peter Kovacik ◽  
Gabriella del Hierro ◽  
William Livernois ◽  
Karen K. Gleason
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Polymer Films ◽  
Vapor Deposition ◽  
Low Cost ◽  
Scale Up ◽  
Conductive Polymer ◽  
Chemical Vapor ◽  
Next Generation ◽  
Large Area

We demonstrate large-area conductive polymer films using oxidative chemical vapor deposition and apply them to low-cost and durable conductive textiles.

Large-Area <img src="/images/tex/812.gif" alt="\hbox {MgB}_{2}"> Films Fabricated by Scaled-Up Hybrid Physical–Chemical Vapor Deposition

2013 ◽  
Vol 23 (3) ◽  
pp. 7500304-7500304 ◽  
Author(s):  
Teng Tan ◽  
Chenggang Zhuang ◽  
Alex Krick ◽  
Ke Chen ◽  
X Xi
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Surface ◽  
Chemical Vapor ◽  
Residual Resistivity ◽  
Large Area ◽  
Residual Resistivity Ratio ◽  
Resistivity Ratio ◽  
Physical Chemical

A scaled-up hybrid physical-chemical vapor deposition (HPCVD) method has been developed to fabricate large-area high-quality magnesium diboride (MgB2) thin films. The 2-in-diameter MgB2thin films on sapphire (0001) show uniform superconducting properties, includingTc~ 39 K, residual-resistivity ratio ~ 14, andJc(4.2 K) ~ 107A/cm2. X-ray diffraction showed that the films are epitaxial withc-axis normal to the film surface. The film properties are uniform across the 2-in substrate.

Laser chemical vapor deposition of cobalt thin films

1992 ◽  
Vol 72 (8) ◽  
pp. 3480-3484 ◽  
Author(s):  
K. Schulmeister ◽  
J. G. Lunney ◽  
B. Buckley
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Cobalt Thin Films
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