Three-dimensional line edge roughness in pre- and post-dry etch line and space patterns of block copolymer lithography
Keyword(s):
Dry Etch
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In this work, we employ large-scale coarse-grained molecular dynamics (CGMD) simulations to study the three-dimensional line edge roughness associated with line and space patterns of chemo-epitaxially directed symmetric block copolymers.
2020 ◽
Vol 32
(6)
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pp. 2399-2407
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2014 ◽
Vol 14
(8)
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pp. 6143-6145
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2016 ◽
Vol 15
(1)
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pp. 013508
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2009 ◽
Vol 27
(6)
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pp. 2993
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2019 ◽
Vol 241
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pp. 80-91
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