defect annealing
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2022 ◽  
Vol 560 ◽  
pp. 153474
Author(s):  
Daxi Guo ◽  
Hengfeng Gong ◽  
Lei Li ◽  
Jian Wen ◽  
Yiran Xie ◽  
...  

Author(s):  
Andrei Ivanovich Titov ◽  
Konstantin Karabeshkin ◽  
Andrei Struchkov ◽  
Platon Karaseov ◽  
Alexander Azarov

Abstract Realization of radiation-hard electronic devices able to work in harsh environments requires deep understanding the processes of defect formation/evolution occurring in semiconductors bombarded by energetic particles. In the present work we address such intriguing radiation phenomenon as high radiation tolerance of GaN and analyze structural disorder employing advanced co-irradiation schemes where low and high energy implants with different ions have been used. Channeling analysis revealed that the interplay between radiation-stimulated defect annealing and defect stabilization by implanted atoms dominates defect formation in the crystal bulk. Furthermore, the balance between these two processes depends on implanted species. In particular, strong damage enhancement leading to the complete GaN bulk amorphization observed for the samples pre-implanted with fluorine ions, whereas the co-irradiation of the samples pre-implanted with such elements as neon, phosphorus, and argon ions leads to a decrease of the damage.


2021 ◽  
Author(s):  
Michael James Simmonds ◽  
Thomas Schwarz-Selinger ◽  
Marlene Idy Patino ◽  
Matthew J Baldwin ◽  
Russell P Doerner ◽  
...  

Abstract Deuterium (D) plasma exposure during annealing of self-ion damaged tungsten (W) is shown to exhibit reduced defect recovery when compared to annealing without D plasma exposure. In these experiments, samples were first damaged with 20 MeV W ions. Next, samples were annealed either with or without simultaneous D2 plasma exposure. The simultaneous annealed samples were first decorated by D2 plasma at 383 K prior to ramping up to an annealing temperature of 473, 573, 673, or 773 K and held for 1 hour with concurrent plasma exposure. The vacuum annealed samples each had a corresponding temperature history but without D$_2$ plasma treatment. Finally, all samples were exposed to D2 plasma at 383 K to decorate any remaining defects. Nuclear reaction analysis (NRA) and thermal desorption spectroscopy (TDS) shows that the simultaneous plasma-exposed and annealed samples exhibited virtually no defect recovery at annealing temperatures of up to 673 K, and had higher D retention than found in the vacuum annealed samples. TDS results indicate that only the lowest detrapping energy defects recover at an 773~K anneal for the simultaneous plasma annealed samples, while the vacuum annealed samples showed defect recovery at all anneal temperatures. This experiment clearly demonstrates that D occupied defects can significantly reduce or eliminate defect annealing in W, and is consistent with the existence of synergistic plasma exposure/displacement damage effects in fusion-energy relevant plasma facing materials.


2020 ◽  
Vol 43 (1) ◽  
Author(s):  
Onkar Mangla ◽  
Savita Roy ◽  
S Annapoorni ◽  
K Asokan

2019 ◽  
Vol 3 (4) ◽  
pp. 387-393 ◽  
Author(s):  
Jan Bleka ◽  
Eduard V. Monakhov ◽  
Berit S. Avset ◽  
Bengt G. Svensson

Energies ◽  
2019 ◽  
Vol 12 (15) ◽  
pp. 2876
Author(s):  
Fabio Ricco Galluzzo ◽  
Cosimo Gerardi ◽  
Andrea Canino ◽  
Salvatore Lombardo

The Staebler-Wronski effect in amorphous silicon based photovoltaic devices is responsible for degradation of their power conversion efficiency, within approximately the first one thousand hours of light soaking. Several experimental studies led to highlight the performance instability phenomena for the mentioned devices, underling that recovery and improvement of such performance are observable, by subjecting such devices (both of single-junction and tandem types) to DC reverse bias stresses under illumination, or to operation in the Maximum Power Point (MPP) under variable conditions of temperature and illumination. In this work, we present and discuss the results of novel recent outdoor tests on stabilized specimens (i.e., exposed to 1000 h extended light soaking, before our tests) of tandem amorphous/microcrystalline Si (a-Si/µc-Si) photovoltaic (PV) minimodules operating in their MPP, by analyzing the causes of the performance instability effects, systematically observed on a daily scale. During the mentioned tests, we have monitored the solar cell operating temperature and the incident solar spectrum at various times in different days to verify the effect of cell temperature and solar spectrum changes on the cell performances. The experimental results show a clear correlation between performance improvements of the photovoltaic modules and their thermal history during the outdoor tests, proving the interplay between defect build-up at a lower temperature and defect annealing at a higher temperature, taking place in the solar cells operated in MPP during conventional outdoor operation.


2019 ◽  
Vol 3 (6) ◽  
Author(s):  
Aurélien Debelle ◽  
Lionel Thomé ◽  
Isabelle Monnet ◽  
Frédérico Garrido ◽  
Olli H. Pakarinen ◽  
...  

2019 ◽  
Vol 64 (2) ◽  
pp. 151
Author(s):  
S. V. Luniov ◽  
A. I. Zimych ◽  
M. V. Khvyshchun ◽  
V. T. Maslyuk ◽  
I. G. Megela

The isothermal annealing of n-Ge single crystals irradiated with 10-MeV electrons to the fluence Φ = 5 × 1015 cm−2 has been studied. On the basis of the measured temperature dependences of the Hall constant and by solving the electroneutrality equations, the concentrations of radiation-induced defects (A-centers) in irradiated n-Ge single crystals are calculated both before and after the annealing. An anomalous increase of the Hall constant is found, when the irradiated n-Ge single crystals were annealed at Tan = 403 K for up to 3 h. The annealing at the temperature Tan = 393 K for 1 h gave rise to the np conversion in the researched crystals. The revealed effects can be explained by the concentration growth of A-centers owing to the generation of vacancies at the annealing of disordered crystal regions.


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