scholarly journals Dielectric and electrical properties of annealed ZnS thin films. The appearance of the OLPT conduction mechanism in chalcogenides

RSC Advances ◽  
2020 ◽  
Vol 10 (16) ◽  
pp. 9549-9562 ◽  
Author(s):  
J. Koaib ◽  
N. Bouguila ◽  
H. Abassi ◽  
N. Moutia ◽  
M. Kraini ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Electrical Properties ◽  
Conduction Mechanism ◽  
Annealing Temperature ◽  
Electrical And Dielectric Properties

The annealing temperature (Ta) dependence of the structural, morphological, electrical and dielectric properties of ZnS thin films was investigated.

scholarly journals Estimation of The Electrical and Dielectric Properties For Se98Te2 and Se96Te2X2 (X = Zn and Cd) Amorphous Films.

2021 ◽  
Author(s):  
Amira Shakra ◽  
M. Fadel ◽  
A.E. Kalila
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Conduction Mechanism ◽  
Charge Carriers ◽  
Amorphous Films ◽  
Thermal Evaporation Method ◽  
Cbh Model ◽  
X Ray ◽  
Electrical And Dielectric Properties ◽  
Quenching Method

Abstract Bulk glassy Se98Te2 and Se96Te2X2 (X = Zn and Cd) were prepared by melting quenching method. Thin films of various thicknesses (200 – 670 nm) were obtained by the thermal evaporation method. The structure of the prepared compositions was investigated by X-ray and EDX analysis. We studied the effect of Zn and Cd addition on the electric and dielectric properties of Se98Te2 thin films. Our measurements were studied in the temperature range (298-323K) below the glass transition temperature and frequency range (100 Hz-1 MHz). DC conductivity showed a single conduction mechanism by hopping of charge carriers at the band edges for the studied system. The dependence of Ac conductivity on frequency is linear with frequency exponent s lies very close to unit and is independent of temperature. This can be explained by the correlated barrier hopping (CBH) model. The dielectric constant ε1 and dielectric loss ε2 noticed to decrease with frequency and increase with temperature. The maximum barrier height Wm was calculated according to Guinitin.

Structural and Electrical Properties of Vanadium Tungsten Oxide Thin Films Grown on Pt/TiO2/SiO2/Si Substrates

2008 ◽  
Vol 569 ◽  
pp. 73-76
Author(s):  
Sung Pill Nam ◽  
Sung Gap Lee ◽  
Young Hie Lee
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Electrical Properties ◽  
Dielectric Loss ◽  
Annealing Temperature ◽  
Rf Sputtering ◽  
Dielectric Constants ◽  
Si Substrates ◽  
Structural And Electrical Properties ◽  
Tungsten Oxide Thin Films

The V1.9W0.1O5 thin films deposited on Pt/Ti/SiO2/Si substrates by RF sputtering method exhibited fairly good TCR and dielectric properties. It was found that film crystallinity, dielectric properties, and TCR properties were strongly dependent upon the annealing temperature. The dielectric constants of the V1.9W0.1O5 thin films annealed at 300°C were 37.7, with a dielectric loss of 2.535, respectively. Also, the TCR values of the V1.9W0.1O5 thin films annealed at 300°C were about -3.7%/K.

Effect of annealing temperature on the microstructure and optical–electrical properties of Cu–Al–O thin films

2013 ◽  
Vol 74 (12) ◽  
pp. 1672-1677 ◽  
Author(s):  
Y.J. Zhang ◽  
Z.T. Liu ◽  
D.Y. Zang ◽  
X.S. Che ◽  
L.P. Feng ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Annealing Temperature

Electrical Properties of Srta2O6 Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition (Peald)

2001 ◽  
Vol 685 ◽  
Author(s):  
Won-Jae Lee ◽  
Chang-Ho Shin ◽  
In-Kyu You ◽  
Il-Suk Yang ◽  
Sang-Ouk Ryu ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Leakage Current ◽  
Annealing Temperature ◽  
Atomic Layer ◽  
Si Substrates ◽  
Annealing Temperatures ◽  
Layer Deposition ◽  
Current Characteristics

AbstractThe SrTa2O6 (STO) thin films were prepared by plasma enhanced atomic layer deposition (PEALD) with alternating supply of reactant sources, Sr[Ta(C2H5O)5(C4H10NO)]2 {Strontium bis-[tantalum penta-ethoxide dimethyllaminoethoxide]; Sr(Ta(OEt)5▪dmae)2} and O2plasma. It was observed that the uniform and conformal STO thin films were successfully deposited using PEALD and the film thickness per cycle was saturated at about 0.8 nm at 300°C. Electrical properties of SrTa2O6 (STO) thin films prepared on Pt/SiO2/Si substrates with annealing temperatures have been investigated. While the grain size and dielectric constant of STO films increased with increasing annealing temperature, the leakage current characteristics of STO films slightly deteriorated. The leakage current density of a 40nm-STO film was about 5×10−8A/cm2 at 3V.

Electrical Properties of Multilayer Synthesized CuInSi Thin Film

2011 ◽  
Vol 383-390 ◽  
pp. 822-825
Author(s):  
Ping Luan ◽  
Jian Sheng Xie ◽  
Jin Hua Li
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Thin Films ◽  
Electrical Properties ◽  
Annealing Temperature ◽  
Time Effect ◽  
X Ray Diffraction ◽  
Testing Instrument ◽  
X Ray ◽  
Conductivity Type

Using magnetron sputtering technology, the CuInSi thin films were prepared by multilayer synthesized method. The structure of CuInSi films were detected by X-ray diffraction(XRD), the main crystal phase peak is at 2θ=42.458°; The resistivity of films were measured by SDY-4 four-probe meter; The conductive type of the films were tested by DLY-2 conductivity type testing instrument. The results show that the annealing temperature and time effect on the crystal resistivity and crystal structure greatly.

Sign in / Sign up

Export Citation Format

Share Document