A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
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This is the first report on a plasma enhanced spatial atomic layer deposition (APP-ALD) process at atmospheric pressure to grow conducting metallic Cu thin films from a carbene stabilized precursor.
2016 ◽
Vol 28
(23)
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pp. 8443-8452
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2017 ◽
Vol 9
(2)
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pp. 021203
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2018 ◽
Vol 57
(49)
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pp. 16224-16227
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2018 ◽
Vol 17
(3)
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pp. 51-58
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2015 ◽
Vol 764-765
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pp. 138-142
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