Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
1995 ◽
Vol 13
(6)
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pp. 2924-2929
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1998 ◽
Vol 21
(1-4)
◽
pp. 355-366
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2010 ◽
Vol 256
(12)
◽
pp. 3906-3911
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2006 ◽
Vol 527-529
◽
pp. 1079-1082
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1993 ◽
Vol 2
(2-4)
◽
pp. 365-372
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2008 ◽
Vol 310
(15)
◽
pp. 3659-3662
◽
2012 ◽
Vol 51
(8S1)
◽
pp. 08HF05
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2010 ◽
Vol 28
(5)
◽
pp. 1234-1239
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2000 ◽
Vol 39
(Part 1, No. 2A)
◽
pp. 572-576
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1994 ◽
Vol 102
(1181)
◽
pp. 13-17
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