A new microwave coupling scheme for high intensity highly charged ion beam production by high power 24–28 GHz SECRAL ion source

2020 ◽  
Vol 91 (1) ◽  
pp. 013322 ◽  
Author(s):  
J. W. Guo ◽  
L. Sun ◽  
W. Lu ◽  
W. H. Zhang ◽  
Y. C. Feng ◽  
...  
Keyword(s):  
High Power ◽  
High Intensity ◽  
Ion Beam ◽  
Ion Source ◽  
Coupling Scheme ◽  
Beam Production ◽  
Highly Charged Ion

New development of laser ion source for highly charged ion beam production at Institute of Modern Physics (invited)

2016 ◽  
Vol 87 (2) ◽  
pp. 02A917 ◽  
Author(s):  
H. Y. Zhao ◽  
J. J. Zhang ◽  
Q. Y. Jin ◽  
W. Liu ◽  
G. C. Wang ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Laser Ion Source ◽  
Beam Production ◽  
New Development ◽  
Modern Physics ◽  
Highly Charged Ion

Advancement of highly charged ion beam production by superconducting ECR ion source SECRAL (invited)

2016 ◽  
Vol 87 (2) ◽  
pp. 02A707 ◽  
Author(s):  
L. Sun ◽  
J. W. Guo ◽  
W. Lu ◽  
W. H. Zhang ◽  
Y. C. Feng ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Beam Production ◽  
Highly Charged Ion

High-Power Ion Beam Characteristics of a Magnetic Multi-Pole Line-Cusp Ion Source for the HL-2A Tokomak

2009 ◽  
Vol 26 (8) ◽  
pp. 082901 ◽  
Author(s):  
Zou Gui-Qing ◽  
Lei Guang-Jiu ◽  
Jiang Shao-Feng ◽  
Cao Jian-Yong ◽  
Yu Li-Ming ◽  
...  
Keyword(s):  
High Power ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Characteristics

High intensity metal ion beam production with ECR ion sources at the Lawrence Berkeley National Laboratory

2002 ◽  
Vol 73 (2) ◽  
pp. 521-524 ◽  
Author(s):  
D. Wutte ◽  
S. Abbott ◽  
M. A. Leitner ◽  
C. M. Lyneis
Keyword(s):  
High Intensity ◽  
Metal Ion ◽  
Ion Beam ◽  
National Laboratory ◽  
Ion Sources ◽  
Lawrence Berkeley National Laboratory ◽  
Beam Production

Beam-Plasma Type Ion Source for High-Intensity Ion Beam and Its Application to Surface Micro-Analyzer

1974 ◽  
Vol 13 (S1) ◽  
pp. 423
Author(s):  
Toshinori Takagi ◽  
Isao Yamada ◽  
Junzo Ishikawa ◽  
Fumimichi Sano ◽  
Toru Kishi
Keyword(s):  
High Intensity ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Plasma

scholarly journals Generation and transportation of high-intensity pulsed ion beam at varying background pressures

2017 ◽  
Vol 35 (4) ◽  
pp. 587-596 ◽  
Author(s):  
X.P. Zhu ◽  
L. Ding ◽  
Q. Zhang ◽  
Yu. Isakova ◽  
Y. Bondarenko ◽  
...  
Keyword(s):  
Energy Density ◽  
High Intensity ◽  
Focal Point ◽  
Ion Beam ◽  
Industrial Applications ◽  
Ion Source ◽  
Beam Deflection ◽  
Appreciable Change ◽  
Energy Density Distribution ◽  
Wide Range

AbstractHigh-intensity pulsed ion beam (HIPIB) technology is developed as an advanced manufacturing method for components with improved wear, corrosion and/or fatigue performance, etc. Robust HIPIB equipment with stable repetitive operation, long-lifetime, and easy maintenance are desired for industrial applications, on which stability of ion beam parameters is critical to achieve consistent result of reproducibility. Here, magnetically insulated ion diodes (MIDs) as ion source with durable graphite anode are investigated in a simple self-magnetic field configuration under repetitive operation. Influence of background pressure on ion beam generation and transportation is emphasized since ion beam sources were intrinsically a vacuum-based system. Comparative experiments were conducted on two types of HIPIB equipment, that is, TEMP-6 and TEMP-4M, differing in vacuum packages where turbo-molecular pump or oil diffusion pump was used. Both the HIPIB equipments are operated on a bipolar pulse mode, that is, a first negative pulse of 150–200 kV with pulse duration 450–500 ns to generate anode plasma on explosive electron emission, and a second positive pulse of 200–250 kV with 120 ns to accelerate the ions. Ion beam energy density up to 8 J/cm2 is achievable using MIDs of geometrical focusing configuration, and the total energy, energy density distribution along cross-section, deflection and divergence, and charge neutralization of the ion beams are assessed under background pressures in a wide range of two orders of magnitude, that is, 1–100 mPa. No appreciable change in the parameters is observed up to 50 mPa, and merely a slight increase in the beam deflection from about ±3 mm to about ±4 mm at the focal point over 50 mPa. The stability of ion beam at the varied pressure is mainly facilitated by the higher pressure up to several Pa in anode–cathode gap during plasma generation and good neutralizing effect for ion beam transportation.

Double hollow cathode ion source for metal ion-beam production

1991 ◽  
Vol 55 (1-4) ◽  
pp. 331-334 ◽  
Author(s):  
Akira Tonegawa ◽  
Hirokazu Taguchi ◽  
Kazuo Takayama
Keyword(s):  
Hollow Cathode ◽  
Metal Ion ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Production
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