Tribological Behavior of Ceramic Surface Layers of Ring and Box Spinning Machines Aluminum Elements Rubbing against Yarn

2008 ◽  
Vol 51 (6) ◽  
pp. 691-698
Author(s):  
Stanisław Płonka ◽  
Andrzej Posmyk
Keyword(s):  
Tribological Behavior ◽  
Ceramic Surface ◽  
Surface Layers

MACHINERY OPERATIONAL PROPERTY CONTROL DURING DIAMOND-ABRASIVE FINISHING USING ACTIVE SOTS

2020 ◽  
Vol 2020 (9) ◽  
pp. 13-17
Author(s):  
Yuriy Ryzhov ◽  
Svetlana Abramova
Keyword(s):  
Corrosion Inhibitors ◽  
Tribological Behavior ◽  
Surface Layers ◽  
Physical Chemical ◽  
Abrasive Finishing ◽  
Alloying Additives ◽  
Phosphorus Containing ◽  
Micro Emulsion ◽  
Property Control ◽  
Diamond Abrasive

There is carried out a number of experiments with the purpose of analyzing SOTS impact upon both finishing productivity, and physical-chemical state and tribological behavior of surfaces machined, and also a possibility for creation according to the results of the investigations carried out a relatively universal micro-emulsion SOTS based on existing in the Ukraine the line of oils, PAV, corrosion inhibitors, alloying additives etc. As SOTS samples there were used both well-known compouds, for example, Camix, Nope Right (USA), and carbamide having in its structure boron, boron-phosphorus-containing additive, water-solvable phosphate, tributyl phosphate (oil-solvable), concentrate SOTS tribol, having in its structure compounds of boron, nitrogen and phosphorous; ethylic ether of fatty acids; methyl ether of colza oil; Sarkozyl-O having in its structure easily-decomposable chlorine compounds. From the results obtained it is possible to draw a conclusion that during finishing in the environment of water-compatible SOTS an important role in the formation of the properties of the surface worked is played by hydrocarbon components and additives which contribute to the formation of the thinnest surface layers modified with carbon and oxygen.

MACHINERY OPERATIONAL PROPERTY CONTROL DURING DIAMOND-ABRASIVE FINISHING USING ACTIVE SOTS

2020 ◽  
Vol 2020 (9) ◽  
pp. 13-18
Author(s):  
Yuriy Ryzhov ◽  
Svetlana Abramova
Keyword(s):  
Corrosion Inhibitors ◽  
Tribological Behavior ◽  
Surface Layers ◽  
Physical Chemical ◽  
Abrasive Finishing ◽  
Alloying Additives ◽  
Phosphorus Containing ◽  
Micro Emulsion ◽  
Property Control ◽  
Diamond Abrasive

There is carried out a number of experiments with the purpose of analyzing SOTS impact upon both finishing productivity, and physical-chemical state and tribological behavior of surfaces machined, and also a possibility for creation according to the results of the investigations carried out a relatively universal micro-emulsion SOTS based on existing in the Ukraine the line of oils, PAV, corrosion inhibitors, alloying additives etc. As SOTS samples there were used both well-known compouds, for example, Camix, Nope Right (USA), and carbamide having in its structure boron, boron-phosphorus-containing additive, water-solvable phosphate, tributyl phosphate (oil-solvable), concentrate SOTS tribol, having in its structure compounds of boron, nitrogen and phosphorous; ethylic ether of fatty acids; methyl ether of colza oil; Sarkozyl-O having in its structure easily-decomposable chlorine compounds. From the results obtained it is possible to draw a conclusion that during finishing in the environment of water-compatible SOTS an important role in the formation of the properties of the surface worked is played by hydrocarbon components and additives which contribute to the formation of the thinnest surface layers modified with carbon and oxygen.

Treаtment of аluminа сerаmiсs by intense eleсtrоn аnd iоn beаms

2021 ◽  
Vol 102 (2) ◽  
pp. 50-55
Author(s):  
S.А. Ghyngаzоv ◽  
◽  
V.А. Kоstenkо ◽  
S.V. Matrenin ◽  
A.I. Kupchishin ◽  
...  
Keyword(s):  
Electron Beam Irradiation ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Beam Current ◽  
Ion Beams ◽  
Ceramic Surface ◽  
Carbon Ions ◽  
Alumina Ceramics ◽  
Beam Irradiation ◽  
Surface Layers

The paper investigated modification of the microstructure of the surface layers of alumina ceramics under exposure to electron and ion beams. Electron beam irradiation was performed at accelerating voltage U = 15 kV and beam current of J = 70 A and J = 100 A. Ion irradiation was performed with carbon ions at accelerating voltage of U = 180 keV. The current density and energy density varied in the range of 15–85 A/cm2 and 0.3–1.5 J/cm2 , respectively. The amount of energy acting on the ceramic surface depended on the number of pulses N. It is shown that exposure to electron and ion beams changes the microstructure of the irradiated ceramic layer. In general, the effect of exposure is similar for electron and ion irradiation, and it is characterized not only by surface melting, but also by formation of a finer microstructure through the depth of the irradiated layer, which is oriented in the direction of the electron and ion beam exposure. It is shown that crystallization processes in overheated layers of ceramics depend on its type and melting point.

Plasma electrolytic fabrication of oxide ceramic surface layers for tribotechnical purposes on aluminium alloys

1998 ◽  
Vol 110 (3) ◽  
pp. 140-146 ◽  
Author(s):  
A.L. Yerokhin ◽  
A.A. Voevodin ◽  
V.V. Lyubimov ◽  
J. Zabinski ◽  
M. Donley
Keyword(s):  
Aluminium Alloys ◽  
Oxide Ceramic ◽  
Ceramic Surface ◽  
Surface Layers ◽  
Plasma Electrolytic

Comments on collision mechanics in ring systems

1984 ◽  
Vol 75 ◽  
pp. 407-422
Author(s):  
William K. Hartmann
Keyword(s):  
Asteroid Belt ◽  
Surface Erosion ◽  
Surface Layers ◽  
Ring Systems ◽  
Eclipse Observations ◽  
Saturn’S Rings ◽  
Saturn's Rings

ABSTRACTThe nature of collisions within ring systems is reviewed with emphasis on Saturn's rings. The particles may have coherent icy cores and less coherent granular or frosty surface layers, consistent with thermal eclipse observations. Present-day collisions of such ring particles do not cause catastrophic fragmentation of the particles, although some minor surface erosion and reaccretion is possible. Evolution by collisional fragmentation is thus not as important as in the asteroid belt.

Applications of Photoelectron Microscopy

1976 ◽  
Vol 34 ◽  
pp. 506-507
Author(s):  
William J. Baxter
Keyword(s):  
Electron Microscopy ◽  
Thermal Decomposition ◽  
Chemical Composition ◽  
Ultraviolet Radiation ◽  
Thin Layer ◽  
Edge Effects ◽  
Electron Optics ◽  
Surface Layers ◽  
Crystalline Orientation ◽  
Fluorescent Screen

In this form of electron microscopy, photoelectrons emitted from a metal by ultraviolet radiation are accelerated and imaged onto a fluorescent screen by conventional electron optics. image contrast is determined by spatial variations in the intensity of the photoemission. The dominant source of contrast is due to changes in the photoelectric work function, between surfaces of different crystalline orientation, or different chemical composition. Topographical variations produce a relatively weak contrast due to shadowing and edge effects.Since the photoelectrons originate from the surface layers (e.g. ∼5-10 nm for metals), photoelectron microscopy is surface sensitive. Thus to see the microstructure of a metal the thin layer (∼3 nm) of surface oxide must be removed, either by ion bombardment or by thermal decomposition in the vacuum of the microscope.

Etching of Polymers by Oxygen Plasma

1968 ◽  
Vol 26 ◽  
pp. 408-409
Author(s):  
Virgil Peck ◽  
W. L. Carter
Keyword(s):  
Molecular Weight ◽  
Oxygen Plasma ◽  
Flow Time ◽  
Microscopical Study ◽  
Surface Layers ◽  
Organic Vapors ◽  
Sample Position ◽  
Accuracy Of Measurement ◽  
Bulk Polymers ◽  
Electron Microscopical

Any electron microscopical study of the morphology of bulk polymers has throughout the years been hampered by the lack of any real ability to produce meaningful surface variations for replication. True etching of polymers should show crystalline and amorphous regions in some form of relief. The use of solvents, acids, organic vapors, and inert ion bombardment to etch samples has proved to be useful only in limited applications. Certainly many interpretations of these results are subject to question.The recent use of a radiofrequency (R. F.) plasma of oxygen to degrade and remove organic material with only minor heating has opened a new possibility for etching polymers. However, rigid control of oxygen flow, time, current, and sample position are necessary in order to obtain reproducible results. The action is confined to surface layers; the molecular weight of the polymer residue after heavy etching is the same as the molecular weight of the polymer before attack, within the accuracy of measurement.

Surface reconstructions of (001) cleaved GdBa2Cu3O7-δ

1992 ◽  
Vol 50 (1) ◽  
pp. 106-107
Author(s):  
H.W. Zandbergen ◽  
M.R. McCartney
Keyword(s):  
Electron Microscopy ◽  
Copper Oxide ◽  
Grain Boundaries ◽  
Atomic Structure ◽  
Oxygen Deficiency ◽  
Surface Layers ◽  
Layer Sequence ◽  
Surface Reconstructions ◽  
Good Agreement

Very few electron microscopy papers have been published on the atomic structure of the copper oxide based superconductor surfaces. Zandbergen et al. have reported that the surface of YBa2Cu3O7-δ was such that the terminating layer sequence is bulk-Y-CuO2-BaO-CuO-BaO, whereas the interruption at the grain boundaries is bulk-Y-CuO2-BaO-CuO. Bursill et al. reported that HREM images of the termination at the surface are in good agreement with calculated images with the same layer sequence as observed by Zandbergen et al. but with some oxygen deficiency in the two surface layers. In both studies only one or a few surfaces were studied.

TEM study of Cosi2 formation via annealing of Co-Ti bilayers on Si

1995 ◽  
Vol 53 ◽  
pp. 464-465
Author(s):  
N. David Theodore ◽  
Andre Vantomme ◽  
Peter Crazier
Keyword(s):  
Thermal Instability ◽  
Lattice Mismatch ◽  
Field Effect Transistors ◽  
Contact Layer ◽  
Interface Roughness ◽  
Oxide Semiconductor ◽  
Surface Layers ◽  
Silicide Layer ◽  
Small Lattice ◽  
Buried Layers

Contact is typically made to source/drain regions of metal-oxide-semiconductor field-effect transistors (MOSFETs) by use of TiSi2 or CoSi2 layers followed by AI(Cu) metal lines. A silicide layer is used to reduce contact resistance. TiSi2 or CoSi2 are chosen for the contact layer because these silicides have low resistivities (~12-15 μΩ-cm for TiSi2 in the C54 phase, and ~10-15 μΩ-cm for CoSi2). CoSi2 has other desirable properties, such as being thermally stable up to >1000°C for surface layers and >1100°C for buried layers, and having a small lattice mismatch with silicon, -1.2% at room temperature. During CoSi2 growth, Co is the diffusing species. Electrode shorts and voids which can arise if Si is the diffusing species are therefore avoided. However, problems can arise due to silicide-Si interface roughness (leading to nonuniformity in film resistance) and thermal instability of the resistance upon further high temperature annealing. These problems can be avoided if the CoSi2 can be grown epitaxially on silicon.

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