scholarly journals Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering

2016 ◽  
Vol 5 (3) ◽  
pp. 158-169 ◽  
Author(s):  
Moritz to Baben ◽  
Marcus Hans ◽  
Daniel Primetzhofer ◽  
Simon Evertz ◽  
Holger Ruess ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Aluminum Nitride ◽  
Point Defect ◽  
Defect Engineering ◽  
Titanium Aluminum ◽  
Titanium Aluminum Nitride ◽  
Thermal Stability Of

Titanium-aluminum nitride film growth and related chemistry using dimethylamino-based precursors

2001 ◽  
Vol 385 (1-2) ◽  
pp. 66-73 ◽  
Author(s):  
J.P Endle ◽  
Y.-M Sun ◽  
J Silverman ◽  
N Nguyen ◽  
A H. Cowley ◽  
...  
Keyword(s):  
Aluminum Nitride ◽  
Film Growth ◽  
Nitride Film ◽  
Titanium Aluminum ◽  
Titanium Aluminum Nitride

Point Defects in Relaxed Si1-xGex Alloy Layers

1998 ◽  
Vol 510 ◽  
Author(s):  
A. Mesli ◽  
A. Nylandsted Larsen
Keyword(s):  
Thermal Stability ◽  
Point Defect ◽  
Band Gap ◽  
Charge State ◽  
Point Defects ◽  
Buffer Layers ◽  
Threading Dislocations ◽  
Band Gap Engineering ◽  
The Impact ◽  
Thermal Stability Of

AbstractThe use of compositionally graded buffer layers in the growth of fully relaxed epitaxial Si1−xGex alloy layers has led to a major improvement in crystalline quality. A considerable reduction in the density of the threading dislocations has become possible, facilitating point defect studies in these materials. The issues addressed in this review are inherent to the coupling between band gap engineering and defect-related levels. Among them, the pinning behaviour, charge state effects and their consequence upon the thermal stability of point defects are discussed together with the impact of the fluctuation in Ge distribution

Titanium–aluminum–nitride coatings for satellite temperature control

2000 ◽  
Vol 370 (1-2) ◽  
pp. 268-277 ◽  
Author(s):  
Maria Brogren ◽  
Geoffrey L Harding ◽  
Richard Karmhag ◽  
Carl G Ribbing ◽  
Gunnar A Niklasson ◽  
...  
Keyword(s):  
Aluminum Nitride ◽  
Temperature Control ◽  
Titanium Aluminum ◽  
Nitride Coatings ◽  
Titanium Aluminum Nitride

Deposition and characterization of non-conducting silicon nitride, aluminum nitride and titanium-aluminum nitride thin films

1993 ◽  
Vol 59 (1-3) ◽  
pp. 187-192 ◽  
Author(s):  
I.J.R. Baumvol ◽  
F.C. Stedile ◽  
W.H. Schreiner ◽  
F.L. Freire ◽  
A. Schröer
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Aluminum Nitride ◽  
Titanium Aluminum ◽  
Titanium Aluminum Nitride
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