Ferromagnetism of Co-doped TiO2films prepared by plasma enhanced chemical vapour deposition (PECVD) method

2008 ◽  
Vol 41 (19) ◽  
pp. 195007 ◽  
Author(s):  
Y B Lin ◽  
Y M Yang ◽  
B Zhuang ◽  
S L Huang ◽  
L P Wu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Co Doped

scholarly journals Aluminium/gallium, indium/gallium, and aluminium/indium co-doped ZnO thin films deposited via aerosol assisted CVD

2018 ◽  
Vol 6 (3) ◽  
pp. 588-597 ◽  
Author(s):  
Dominic B. Potter ◽  
Michael J. Powell ◽  
Ivan P. Parkin ◽  
Claire J. Carmalt
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Zno Thin Films ◽  
Glass Substrates ◽  
Doped Zno ◽  
Indium Gallium ◽  
Co Doped

Aluminium/gallium co-doped ZnO (AGZO), indium/gallium co-doped ZnO (IGZO), and aluminium/indium co-doped ZnO (AIZO) thin films were synthesised on glass substrates via aerosol assisted chemical vapour deposition (AACVD).

scholarly journals Transparent conductive aluminium and fluorine co-doped zinc oxide films via aerosol assisted chemical vapour deposition

RSC Advances ◽  
2014 ◽  
Vol 4 (91) ◽  
pp. 49723-49728 ◽  
Author(s):  
Sapna D. Ponja ◽  
Sanjayan Sathasivam ◽  
Ivan P. Parkin ◽  
Claire J. Carmalt
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Zno Thin Films ◽  
Glass Substrates ◽  
Zinc Oxide Films ◽  
Doped Zno ◽  
Co Doped

Aerosol assisted chemical vapour deposition (AACVD) was employed to synthesise highly transparent and conductive ZnO, fluorine or aluminium doped and aluminium–fluorine co-doped ZnO thin films on glass substrates at 450 °C.

Synthesis and structural characterization of undoped and Co doped zinc oxide thin films obtained by aerosol assisted chemical vapour deposition

2009 ◽  
Vol 483 (1-2) ◽  
pp. 410-413 ◽  
Author(s):  
P. Amézaga-Madrid ◽  
W. Antúnez-Flores ◽  
R.J. Sáenz-Hernández ◽  
R. Martínez-Sánchez ◽  
M. Miki-Yoshida
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Structural Characterization ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Oxide Thin Films ◽  
Co Doped

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-395-Pr8-402 ◽  
Author(s):  
B. Armas ◽  
M. de Icaza Herrera ◽  
C. Combescure ◽  
F. Sibieude ◽  
D. Thenegal
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Cold Wall ◽  
Pressure Chemical ◽  
Mullite Coatings

Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-373-Pr8-380 ◽  
Author(s):  
P. Sourdiaucourt ◽  
A. Derré ◽  
P. Delhaès ◽  
P. David
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hafnium Carbide ◽  
Experimental Conditions
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