FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
2000 ◽
Vol 17
(12)
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pp. 912-914
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1988 ◽
Vol 6
(1)
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pp. 470
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Keyword(s):
1997 ◽
Vol 36
(Part 2, No. 7B)
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pp. L922-L925
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Keyword(s):
1997 ◽
Vol 36
(Part 1, No. 1A)
◽
pp. 267-275
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Keyword(s):
2002 ◽
Vol 20
(3)
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pp. 828
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Keyword(s):
Keyword(s):
1992 ◽
Vol 139
(4)
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pp. 1151-1159
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Keyword(s):