Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning

2011 ◽  
Vol 21 (4) ◽  
pp. 045038 ◽  
Author(s):  
Stefan Eder Kapl ◽  
Hans Loeschner ◽  
Walter Piller ◽  
Martin Witt ◽  
Wolfgang Pilz ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Beam Projection

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

Characterization of AZ PN114 resist for soft-x-ray projection lithography

1993 ◽  
Vol 32 (34) ◽  
pp. 7044 ◽  
Author(s):  
K. Early ◽  
D. M. Tennant ◽  
D. Y. Jeon ◽  
P. P. Mulgrew ◽  
A. A. MacDowell ◽  
...  
Keyword(s):  
X Ray ◽  
Projection Lithography ◽  
Ray Projection

In-Plane Gravity Loading of a Circular Membrane

2000 ◽  
Vol 67 (4) ◽  
pp. 837-839 ◽  
Author(s):  
R. O. Tejeda ◽  
E. G. Lovell ◽  
R. L. Engelstad
Keyword(s):  
Displacement Field ◽  
Ion Beam ◽  
Stress And Strain ◽  
Circular Membrane ◽  
Next Generation ◽  
Projection Lithography ◽  
Beam Projection ◽  
Lithographic Masks

This paper develops the displacement field for a circular membrane which is statically loaded by gravity acting in its plane. Coupled to the displacements are the stress and strain distributions. The solution is applicable to the modeling of next generation lithographic masks, ion-beam projection lithography masks in particular. [S0021-8936(00)00803-5]

High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3827-3832 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
High Speed ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction ◽  
Correction System

Stencil Mask Technology for Electron-Beam Projection Lithography

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3811-3815 ◽  
Author(s):  
Isao Amemiya ◽  
Hiroshi Yamashita ◽  
Sakae Nakatsuka ◽  
Tadashi Sakurai ◽  
Ikuru Kimura ◽  
...  
Keyword(s):  
Electron Beam ◽  
Projection Lithography ◽  
Stencil Mask ◽  
Beam Projection

Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

2001 ◽  
Author(s):  
Takao Tamura ◽  
Takahiro Ema ◽  
Hiroshi Nozue ◽  
Tamoya Sugahara ◽  
Akio Sugano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Measurement System ◽  
Direct Writing ◽  
Accuracy Measurement ◽  
Projection Lithography ◽  
Beam Projection

Relativistic Focus Condition for E-Beam Projection Lithography

2004 ◽  
Vol 43 (12) ◽  
pp. 8044-8047
Author(s):  
Jung-Il Kim ◽  
Yanyu Wei ◽  
Gun-Sik Park ◽  
Dong-Wook Kim ◽  
In-Kyeong Yoo
Keyword(s):  
Projection Lithography ◽  
Focus Condition ◽  
Beam Projection
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