Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning

2011 ◽  
Vol 21 (4) ◽  
pp. 045038 ◽  
Author(s):  
Stefan Eder Kapl ◽  
Hans Loeschner ◽  
Walter Piller ◽  
Martin Witt ◽  
Wolfgang Pilz ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Beam Projection

Influence of electron acceleration voltage in the cell-projection lithography system

2000 ◽  
Vol 53 (1-4) ◽  
pp. 353-356
Author(s):  
M. Kotera ◽  
K. Yamaguchi ◽  
M. Sakai ◽  
K. Naruse ◽  
T. Okagawa ◽  
...  
Keyword(s):  
Electron Acceleration ◽  
Projection Lithography ◽  
Acceleration Voltage ◽  
Lithography System

In-Plane Gravity Loading of a Circular Membrane

2000 ◽  
Vol 67 (4) ◽  
pp. 837-839 ◽  
Author(s):  
R. O. Tejeda ◽  
E. G. Lovell ◽  
R. L. Engelstad
Keyword(s):  
Displacement Field ◽  
Ion Beam ◽  
Stress And Strain ◽  
Circular Membrane ◽  
Next Generation ◽  
Projection Lithography ◽  
Beam Projection ◽  
Lithographic Masks

This paper develops the displacement field for a circular membrane which is statically loaded by gravity acting in its plane. Coupled to the displacements are the stress and strain distributions. The solution is applicable to the modeling of next generation lithographic masks, ion-beam projection lithography masks in particular. [S0021-8936(00)00803-5]

High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3827-3832 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
High Speed ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction ◽  
Correction System
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