Characterization of pulsed atmospheric-pressure plasma streams (PAPS) generated by a plasma gun

2012 ◽  
Vol 21 (3) ◽  
pp. 034017 ◽  
Author(s):  
E Robert ◽  
V Sarron ◽  
D Riès ◽  
S Dozias ◽  
M Vandamme ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Gun ◽  
Pressure Plasma

Surface Characterization of Argon/Methane Mixture Atmospheric-Pressure Plasma-Treated Filtration Poly(Vinylidene Fluoride) Membrane and Its Flux Enhancement

2014 ◽  
Vol 42 (12) ◽  
pp. 3698-3702 ◽  
Author(s):  
Ruey-Shin Juang ◽  
Ko-Shao Chen ◽  
Ta-Chin Wei ◽  
Chi-Hung Liu ◽  
Ching-Yuan Tsai ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Surface Characterization ◽  
Vinylidene Fluoride ◽  
Atmospheric Pressure Plasma ◽  
Flux Enhancement ◽  
Pressure Plasma ◽  
Poly Vinylidene Fluoride ◽  
Methane Mixture

scholarly journals Characterization of a Cold Atmospheric Pressure Plasma Jet Device Driven by Nanosecond Voltage Pulses

2015 ◽  
Vol 43 (3) ◽  
pp. 713-725 ◽  
Author(s):  
Marco Boselli ◽  
Vittorio Colombo ◽  
Matteo Gherardi ◽  
Romolo Laurita ◽  
Anna Liguori ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma ◽  
Cold Atmospheric Pressure Plasma ◽  
Voltage Pulses

Spatio-temporal characterization of a pulsed DC atmospheric pressure plasma jet interacting with substrates

2020 ◽  
Vol 54 (8) ◽  
pp. 085202
Author(s):  
Michael J Johnson ◽  
David R Boris ◽  
Tzvetelina B Petrova ◽  
Scott G Walton
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Jet ◽  
Atmospheric Pressure Plasma Jet ◽  
Pressure Plasma ◽  
Pulsed Dc ◽  
Spatio Temporal

Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing

2005 ◽  
Vol 107 ◽  
pp. 119-124 ◽  
Author(s):  
Jacek Kędzierski ◽  
Jürgen Engemann ◽  
Markus Teschke ◽  
Dariusz Korzec
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Atmospheric Pressure Plasma ◽  
Cylindrical Symmetry ◽  
Plasma Jets ◽  
Partial Explanation ◽  
Plasma Gun ◽  
Pressure Plasma ◽  
Model Formation ◽  
2D And 3D

A novel atmospheric pressure plasma jet with a cylindrical symmetry i.e. a tubular dielectric barrier and two tubular electrodes was developed at Microstructure Research Center – fmt, Wuppertal, Germany. The jet was investigated by means of ultra fast (down to tens of nanoseconds exposition time) ICCD photography and regular CCD photography. Some spectacular results were achieved and their partial explanation was presented. The jet acts as a “plasma gun” throwing small “plasma bullets” out of its orifice. The most important findings are: (i) the bullet velocity is approximately 3 orders of magnitude larger than the gas flow velocity, and (ii) the jet dynamics is mainly electrical field controlled. A simple model - formation of a jet in air - based on a Helium metastables core can explain qualitatively reasonably well most of our experimental observations. Some variations of the original cylindrical jet geometry were presented and discussed: microjet and fmt Plasma-Pen, single tube multijet, tube-in-tube single and multijet systems (so-called “Wuppertal-Approach”).

Characterization of Si and SiOxfilms deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors

2015 ◽  
Vol 212 (7) ◽  
pp. 1571-1577 ◽  
Author(s):  
Hiroaki Kakiuchi ◽  
Hiromasa Ohmi ◽  
Takahiro Yamada ◽  
Shogo Tamaki ◽  
Takayuki Sakaguchi ◽  
...  
Keyword(s):  
Thin Film ◽  
Atmospheric Pressure ◽  
High Frequency ◽  
Thin Film Transistors ◽  
Atmospheric Pressure Plasma ◽  
Very High Frequency ◽  
Pressure Plasma ◽  
Very High ◽  
Bottom Gate

Surface Characterization of Atmospheric Pressure Plasma-Deposited Allyl Methacrylate and Acrylic Acid Based Coatings

2013 ◽  
Vol 10 (6) ◽  
pp. 564-571 ◽  
Author(s):  
Bernard Nisol ◽  
Abdelkrim Batan ◽  
François Dabeux ◽  
Alexandros Kakaroglou ◽  
Iris De Graeve ◽  
...  
Keyword(s):  
Acrylic Acid ◽  
Atmospheric Pressure ◽  
Surface Characterization ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma ◽  
Allyl Methacrylate

Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

2006 ◽  
Vol 45 (4B) ◽  
pp. 3592-3597 ◽  
Author(s):  
Kiyoshi Yasutake ◽  
Hiromasa Ohmi ◽  
Hiroaki Kakiuchi ◽  
Takuya Wakamiya ◽  
Heiji Watanabe
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Pressure Plasma ◽  
Si Films
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