A novel two-step strategy to fabricate phase-pure SnS photoelectrode with tunable conductivity: formation mechanism and photoelectrochemical properties

Author(s):  
Wenwan Zhang ◽  
Yufei Cheng ◽  
Junfeng Zhao ◽  
Qiujie Li ◽  
Jiawei Wang ◽  
...  

Abstract Tin monosulfide (SnS), as a narrow band gap semiconductor for visible-light harvesting, nevertheless the easy formation of secondary phases such as Sn2S3 and SnS2 severely restricts its photoelectrochemical properties. Herein, we proposed a novel two-step strategy to fabricate phase-pure SnS photoelectrode with tunable conductivity on Ti foil substrate and carefully investigated the formation mechanism and photoelectrochemical properties. The tunable conductivity is determined by Na2SO4 pretreatment before annealing, which is supported by the EDS, XPS, and EPR characterizations. Na+ adsorbed to the edge of the precursor SnS2 nanosheets forming a dangling bond adsorption will protect S2- against reacting with the trace oxygen in the CVD system within a certain temperature range (< 525 ℃), thereby reducing the generation of S vacancies to adjust the S/Sn ratio and further regulating the conductivity type. Moreover, the anodic photocurrent density of SnS thin films was about 0.32 mA/cm2 at 1.23 V vs. RHE with the separation and injection efficiency of 1.22 % and 72.78 % and a maximum cathodic photocurrent density can reach approximately -0.36 mA/cm2 at 0 V vs. RHE with the separation and injection efficiency 1.15 % and 5.44 % respectively. The method shown in this work provides an effective approach to control the electrical conductivity of SnS thin films with considerable photocurrent response for phase-pure SnS.

Materials ◽  
2019 ◽  
Vol 12 (13) ◽  
pp. 2042 ◽  
Author(s):  
Nikolai Helth Gaukås ◽  
Silje Marie Dale ◽  
Trygve Magnus Ræder ◽  
Andreas Toresen ◽  
Randi Holmestad ◽  
...  

Aqueous chemical solution deposition (CSD) of lead-free ferroelectric K0.5Na0.5NbO3 (KNN) thin films has a great potential for cost-effective and environmentally friendly components in microelectronics. Phase purity of KNN is, however, a persistent challenge due to the volatility of alkali metal oxides, usually countered by using excess alkali metals in the precursor solutions. Here, we report on the development of two different aqueous precursor solutions for CSD of KNN films, and we demonstrate that the decomposition process during thermal processing of the films is of detrimental importance for promoting nucleation of KNN and suppressing the formation of secondary phases. Based on thermal analysis, X-ray diffraction and IR spectroscopy of films as well as powders prepared from the solutions, it was revealed that the decomposition temperature can be controlled by chemistry resulting in phase pure KNN films. A columnar microstructure with out-of-plane texturing was observed in the phase pure KNN films, demonstrating that the microstructure is directly coupled to the thermal processing of the films.


2015 ◽  
Vol 1105 ◽  
pp. 269-273
Author(s):  
Tao Zhu ◽  
Meng Nan Chong ◽  
Eng Seng Chan

The main aim of this study was to investigate size-dependent effect on the photoelectrochemical properties of nanostructured tungsten trioxide (WO3) thin films synthesized via electrochemical method. Firstly, the nanostructured WO3 thin films of different crystalline sizes were synthesized on fluorine-doped tin oxide (FTO) glass working electrodes followed by controlled annealing treatment at temperature of 100-600°C. The resultant nanostructured WO3 thin films were further characterized using field emission-scanning electron microscopy (FE-SEM) and photocurrent density measurements. Through FE-SEM analysis, it was found that the WO3 crystalline size increases with increasing annealing temperature that resulted in elevated photocurrent per unit area of the synthesized nanostructured WO3 thin films. Finally, it was observed that the highest photocurrent density of up to 35μA/cm2 was attained for WO3 crystallines size of 86nm that formed at the annealing temperature of 600°C.


2014 ◽  
Vol 43 (22) ◽  
pp. 8523-8529 ◽  
Author(s):  
Sohail Ahmed ◽  
Muhammad Adil Mansoor ◽  
Muhammad Mazhar ◽  
Tilo Söhnel ◽  
Hamid Khaledi ◽  
...  

Y2CuO4–5CuO composite thin films having a band gap of 1.82 eV and a photocurrent density of 9.85 μA cm−2 at 0.8 V have been deposited from a solution of precursor 1 by AACVD.


2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Aziz Ahmed ◽  
Seungwoo Han

AbstractN-type bismuth telluride (Bi2Te3) thin films were prepared on an aluminum nitride (AlN)-coated stainless steel foil substrate to obtain optimal thermoelectric performance. The thermal co-evaporation method was adopted so that we could vary the thin film composition, enabling us to investigate the relationship between the film composition, microstructure, crystal preferred orientation and thermoelectric properties. The influence of the substrate temperature was also investigated by synthesizing two sets of thin film samples; in one set the substrate was kept at room temperature (RT) while in the other set the substrate was maintained at a high temperature, of 300 °C, during deposition. The samples deposited at RT were amorphous in the as-deposited state and therefore were annealed at 280 °C to promote crystallization and phase development. The electrical resistivity and Seebeck coefficient were measured and the results were interpreted. Both the transport properties and crystal structure were observed to be strongly affected by non-stoichiometry and the choice of substrate temperature. We observed columnar microstructures with hexagonal grains and a multi-oriented crystal structure for the thin films deposited at high substrate temperatures, whereas highly (00 l) textured thin films with columns consisting of in-plane layers were fabricated from the stoichiometric annealed thin film samples originally synthesized at RT. Special emphasis was placed on examining the nature of tellurium (Te) atom based structural defects and their influence on thin film properties. We report maximum power factor (PF) of 1.35 mW/m K2 for near-stoichiometric film deposited at high substrate temperature, which was the highest among all studied cases.


Silicon ◽  
2020 ◽  
Author(s):  
Imen Ammar ◽  
Abdelaziz Gassoumi ◽  
Najoua Turki-Kamoun

2010 ◽  
Vol 15 (4) ◽  
pp. 683-688 ◽  
Author(s):  
Medhat M. Kamel ◽  
Mervat Mohamed Ibrahim

1999 ◽  
Vol 232 (1) ◽  
pp. 147-152
Author(s):  
Wu Xiaoqing ◽  
Ren Wei ◽  
Zhang Liangying ◽  
Yao Xi

Sign in / Sign up

Export Citation Format

Share Document