scholarly journals Study of the wear resistance of ion-plasma coatings based on titanium and aluminum and obtained by magnetron sputtering

2017 ◽  
Vol 857 ◽  
pp. 012016
Author(s):  
G V Kachalin ◽  
A F Mednikov ◽  
A B Tkhabisimov ◽  
S V Sidorov
2021 ◽  
Vol 56 ◽  
pp. 97-107
Author(s):  
M. S. Zayats ◽  

A low-temperature (substrate heating temperature up to 400 °C) ion-plasma technology for the formation of nanostructured AlN and BN films by the method of high-frequency reactive magnetron sputtering of the corresponding targets has been developed (the modernized installation "Cathode-1M"), which has in its technological cycle the means of physical and chemical modification, which allow to purposefully control the phase composition, surface morphology, size and texture of nanocrystalline films. The possibility of using the method of high-frequency magnetron sputtering for deposition of transparent hexagonal BN films in the nanoscale state on quartz and silicon substrates is shown. Atomic force microscopy (AFM) has shown that AlN films can have an amorphous or polycrystalline surface with grain sizes of approximately 20-100 nm, with the height of the nanoparticles varying from 3 to 10 nm and the degree of surface roughness from 1 to 10 nm. It was found that the dielectric penetration of polycrystalline AlN films decreases from 10 to 3.5 at increased frequencies from 25 Hz to 1 MHz, and the peak tangent of the dielectric loss angle reaches 0.2 at 10 kHz. Such features indicate the existence of spontaneous polarization of dipoles in the obtained AlN films. Interest in dielectric properties in AlN / Si structures it is also due to the fact that there are point defects, such as nitrogen vacancies and silicon atoms, which diffuse from the silicon substrate during synthesis and play an important role in the dielectric properties of AlN during the formation of dipoles. The technology makes it possible, in a single technological cycle, to produce multilayer structures modified for specific functional tasks with specified characteristics necessary for the manufacture of modern electronics, optoelectronics and sensorics devices. It should also be noted that the technology of magnetron sputtering (installation "Cathode-1M") is highly productive, energetically efficient and environmentally friendly in comparison with other known technologies for creating semiconductor structures and allows them to be obtained with minimal changes in the technological cycle.


Author(s):  
Diana Hlushkova ◽  
Alexander Voronkov ◽  
Natalia Kalinina ◽  
Vasily Kalinin ◽  
Sergey Demchenko ◽  
...  

Author(s):  
K. V. Diadiun

Providing an increase in the working capacity of a metal-cutting tool, it is possible to significantly increase the productivity of mechanized labor, thereby reducing the cost of purchasing a new tool and saving on other accompanying technological components. During the operation of the cutting tool, the main load is transferred to its working part, this, as a rule, leads to partial wear or complete destruction of the planes and cutting edges. There are a number of technologies for processing working surfaces, which provides them with additional strengthening, the most effective of which is the method of applying special coatings to the surface of the cutting tool. Taking into account the specifics of the processes of formation of coatings, they can be divided into three main groups [1]. The first group includes methods in which the formation of coatings is carried out mainly due to diffusion reactions between saturating elements and structures of the instrumental material. The second group includes methods of forming coatings by a complex mechanism. The third group includes methods of forming coatings due to chemical and plasma-chemical reactions of particle flux simultaneously in volumes of space immediately adjacent to the saturable surfaces of the instrumental base. One such technology is the CIB (condensation and ion bombardment) method, which is a physical deposition of coatings. The most characteristic feature of coatings produced by this method is the absence of a transition zone between the coating and the tool material. This makes it possible to obtain a complex of properties on the working surfaces of the tool without deteriorating its original properties. The article is devoted to the issues of increasing the efficiency of ion-plasma technologies through the development and implementation of an automated system for analyzing and controlling the mass balance of reagent gases under conditions of several gases supply. Thus, the improvement of the technology of coating the working surfaces of the cutting tool, namely, the effective control of the process of applying ion-plasma coatings with the introduction of an automated system for analyzing and controlling the mass balance of reagent gases under conditions of supplying several gases is an urgent task.


2015 ◽  
Vol 642 ◽  
pp. 184-189
Author(s):  
Yan Liang Su ◽  
Yueh Feng Lin

W(100-x)%Cx% coatings with different tungsten and carbon contents were deposited by unbalanced magnetron sputtering. The microstructures and mechanical properties of the W(100-x)%C x% coatings was characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), nanoindentation and adhesion testing techniques. The tribological performance of the coatings was investigated using a pin-on-disc trobometer under dry conditions. Experimental results indicated that coating microstructure, mechanical properties and wear resistance varied according to the tungsten and carbon contents of the coatings. The W72%C28% coating had the highest hardness/elastic modulus (H/E) ratio. In the ball-on-disc wear tests, it was found that the W72%C28% coating exhibited the best wear resistance.


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